Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

ABSTRACT

A liquid immersion member used in an immersion exposure apparatus, and capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light. The liquid immersion member includes a first member that includes a first part disposed at surrounding of an optical path of the exposure light, and in which a first opening part, through which the exposure light is able to pass, and a first liquid supply part, is disposed at at least a portion of surrounding of the first opening part and capable of opposing the surface of the object, are provided at the first part, and a second member includes a first liquid recovery part which can be opposing the surface of the object and is movable with respect to the first member outside the first part with respect to the optical path.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims priority based on U.S. Patent ProvisionalApplication No. 61/746,497, filed Dec. 27, 2012, and the contents ofwhich are incorporated herein by reference.

BACKGROUND Technical Field

The present invention relates to a liquid immersion member, an exposureapparatus, an exposing method, a method of manufacturing a device, aprogram, and a recording medium.

For example, in an exposure apparatus which is used in aphotolithography process, as disclosed in U.S. Pat. No. 7,864,292, aliquid immersion exposure apparatus which exposes a substrate byexposure light via a liquid is known.

For example, in a liquid immersion exposure apparatus, if liquid flowsout from a predetermined space or remains on an object such as asubstrate, exposure failure may occur. As a result, a defective devicemay be manufactured.

An object of an aspect of the present invention is to provide a liquidimmersion member, an exposure apparatus, and an exposing method capableof suppressing occurrences of exposure failure. Moreover, an object ofanother aspect of the present invention is to provide a method ofmanufacturing a device, a program, and a recording medium capable ofsuppressing occurrences of defective devices.

SUMMARY

According to a first aspect of the present invention, there is provideda liquid immersion member that is used in a liquid immersion exposureapparatus, and is capable of forming a liquid immersion space in asurface of an object opposite to an emitting surface of an opticalmember which emits exposure light, including: a first member thatincludes a first part disposed at surrounding of an optical path of theexposure light, and in which a first opening part, through which theexposure light is able to pass, and a first liquid supply part, which isdisposed at at least a portion of surrounding of the first opening partand is capable of opposing the surface of the object, are provided atthe first part; and a second member that includes a first liquidrecovery part which is capable of opposing the surface of the object andis movable with respect to the first member outside the first part withrespect to the optical path.

According to a second aspect of the present invention, there is provideda liquid immersion member that is used in a liquid immersion exposureapparatus, and is capable of forming a liquid immersion space on asurface of an object opposite to an emitting surface of an opticalmember which emits exposure light, including: a first member thatincludes a first part disposed at surrounding of an optical path of theexposure light, and in which a first opening part, through which theexposure light is able to pass, is provided at the first part; and asecond member that includes a first liquid recovery part and a first gassupply part, and is movable with respect to the first member outside thefirst part with respect to the optical path, the first liquid recoverypart being capable of opposing the surface of the object, the first gassupply part being disposed outside the first liquid recovery part in aradial direction with respect to an optical axis of the optical memberand being capable of opposing the surface of the object.

According to a third aspect of the present invention, there is provideda liquid immersion member that is used in a liquid immersion exposureapparatus, and is capable of forming a liquid immersion space on asurface of an object opposite to an emitting surface of an opticalmember which emits exposure light, including: a first member thatincludes a first part disposed at surrounding of an optical path of theexposure light, and in which a first opening part, through which theexposure light is able to pass, is provided at the first part; and asecond member that includes a first liquid recovery part and a secondliquid supply part, and that is movable with respect to the first memberoutside the first part with respect to the optical path, the firstliquid recover part being capable of opposing the surface of the object,the second liquid supply part being disposed between the optical pathand the first liquid recovery part in a radial direction with respect toan optical axis of the optical member and being capable of opposing thesurface of the object.

According to a fourth aspect of the present invention, there is provideda liquid immersion member that is used in a liquid immersion exposureapparatus, and is capable of forming a liquid immersion space on asurface of an object opposite to an emitting surface of an opticalmember which emits exposure light, including: a first member thatincludes a first part disposed at surrounding of an optical path of theexposure light, and in which a first opening part, through which theexposure light is able to pass, is provided at the first part; and asecond member that includes a first liquid recovery part which iscapable of opposing the surface of the object and is movable withrespect to the first member outside the first part with respect to theoptical path; and a second liquid recovery part that is disposed at thefirst member and is capable of recovering at least a portion of liquidwhich has flowed in a gap between the first member and the second memberfrom above the object.

According to a fifth aspect of the present invention, there is provideda liquid immersion member that is used in a liquid immersion exposureapparatus, and is capable of forming a liquid immersion space on asurface of an object opposite to an emitting surface of an opticalmember which emits exposure light, including: a first member thatincludes a first part disposed at surrounding of an optical path of theexposure light, and in which a first opening part, through which theexposure light is able to pass, is provided at the first part; a secondmember that includes a first liquid recovery part which is capable ofopposing the surface of the object and is movable with respect to thefirst member outside the first part with respect to the optical path;and a second liquid recovery part which is capable of recovering atleast a portion of liquid which has flowed in a gap between the firstmember and the second member from above the object, wherein the gapbetween the first member and the second member includes a first gap parthaving a first size, and a second gap part which is disposed outside thefirst gap part with respect to the optical axis of the optical memberand has a second size smaller than the first size, and wherein thesecond liquid recovery part is capable of recovering liquid from thefirst gap part.

According to a sixth aspect of the present invention, there is providedan exposure apparatus which exposes a substrate via liquid by exposurelight, the exposure apparatus including: the liquid immersion memberaccording to any one of the first to fifth aspects.

According to a seventh aspect of the present invention, there isprovided an exposure apparatus that exposes a substrate via liquid byexposure light, including: an optical member that includes an emittingsurface from which the exposure light is emitted; a liquid immersionmember that is capable of forming a liquid immersion space of the liquidon an object capable of moving below the optical member, and includes afirst member which is disposed at at least a portion of surrounding ofan optical path of the exposure light, and a second member in which atleast a portion is disposed to be opposite to the object below the firstmember and which is movable with respect to the first member; and a gassupply part that supplies gas to at least a portion of surrounding ofthe liquid immersion space.

According to an eighth aspect of the present invention, there isprovided a method of manufacturing a device, including: exposing thesubstrate using the exposure apparatus according to the sixth aspect orthe seventh aspect; and developing the exposed substrate.

According to a ninth aspect of the present invention, there is providedan exposing method that exposes a substrate by exposure light via liquidbetween an emitting surface of an optical member emitting the exposurelight and the substrate, including: forming a liquid immersion space ofthe liquid on a surface of the substrate by using a liquid immersionmember that includes a first member and a second member, the firstmember including a first part disposed at surrounding of an optical pathof the exposure light, a first opening part, through which the exposurelight is able to pass, and a first liquid supply part being provided atthe first part of the first member, the first liquid supply part beingdisposed at at least surrounding of the first opening part and beingcapable of opposing the surface of the substrate, the second memberincluding a first liquid recovery part which is capable of opposing thesurface of the substrate and being movable with respect to the firstmember outside the first part with respect to the optical path; exposingthe substrate by the exposure light emitted from the emitting surfacevia the liquid of the liquid immersion space; and moving the secondmember with respect to the first member in at least a portion ofexposure of the substrate.

According to a tenth aspect of the present invention, there is providedan exposing method that exposes a substrate by exposure light via liquidbetween an emitting surface of an optical member emitting the exposurelight and the substrate, including: forming a liquid immersion space ofthe liquid on a surface of the substrate by using a liquid immersionmember that includes a first member and a second member, the firstmember including a first part disposed at surrounding of an optical pathof exposure light, a first opening part, through which the exposurelight is able to pass, being provided at the first part of the firstmember, the second member including a first liquid recovery part and afirst gas supply part and being movable with respect to the first memberoutside the first part with respect to the optical path, the firstliquid recovery part being capable of opposing the surface of theobject, the first gas supply part being disposed outside the firstliquid recovery part in a radial direction with respect to an opticalaxis of an optical member and being capable of opposing the surface ofthe object; exposing the substrate by the exposure light emitted fromthe emitting surface via the liquid of the liquid immersion space; andmoving the second member with respect to the first member in at least aportion of exposure of the substrate.

According to an eleventh aspect of the present invention, there isprovided an exposing method that exposes a substrate to exposure lightvia liquid between an emitting surface of an optical member emitting theexposure light and the substrate, including: forming a liquid immersionspace of the liquid on a surface of the substrate by using a liquidimmersion member that includes a first member and a second member, thefirst member including a first part disposed at surrounding of anoptical path of the exposure light, a first opening part, through whichthe exposure light is able to pass, being provided at the first part ofthe first member, the second member including a first liquid recoverypart and a second liquid supply part and being movable with respect tothe first member outside the first part with respect to the opticalpath, the first liquid recovery part being capable of opposing thesurface of the object, the second liquid supply part being disposedbetween the optical path and the first liquid recovery part in a radialdirection with respect to an optical axis of the optical member andbeing capable of opposing the surface of the object; exposing thesubstrate by the exposure light emitted from the emitting surface viathe liquid of the liquid immersion space; and moving the second memberwith respect to the first member in at least a portion of exposure ofthe substrate.

According to a twelfth aspect of the present invention, there isprovided an exposing method that exposes a substrate by exposure lightvia liquid between an emitting surface of an optical member emitting theexposure light and the substrate, including: forming a liquid immersionspace of the liquid on a surface of the substrate by using a liquidimmersion member that includes a first member, a second member, and asecond liquid recovery part, the first member including a first partdisposed at surrounding of an optical path of the exposure light, afirst opening part, through which the exposure light is able to pass,being provided at the first part of the first member, the second memberincluding a first liquid recovery part and being movable with respect tothe first member outside the first part with respect to the opticalpath, the first liquid recovery part being capable of opposing a surfaceof the object, the second liquid recovery part being disposed at thefirst member and being capable of recovering at least a portion ofliquid which has flowed in a gap between the first member and the secondmember from above the object; exposing the substrate by the exposurelight emitted from the emitting surface via the liquid of the liquidimmersion space; and moving the second member with respect to the firstmember in at least a portion of exposure of the substrate.

According to a thirteenth aspect of the present invention, there isprovided an exposing method that exposes a substrate by exposure lightvia liquid between an emitting surface of an optical member emitting theexposure light and the substrate, including: forming a liquid immersionspace of the liquid on a surface of a substrate by using a liquidimmersion member that includes a first member, a second member, and asecond liquid recovery part, wherein a gap between the first member andthe second member includes a first gap part having a first size, and asecond gap part having a second size which is disposed outside the firstgap part with respect to the optical axis of the optical member and issmaller than the first size, and the second liquid recovery part iscapable of recovering liquid from the first gap part, the first memberincluding a first part disposed at surrounding of an optical path of theexposure light, a first opening part, through which the exposure lightis able to pass, being provided at the first part of the first member,the second member including a first liquid recovery part which iscapable of opposing a surface of the object and being movable withrespect to the first member outside the first part with respect to theoptical path, the second liquid recovery part being capable ofrecovering at least a portion of liquid which has flowed in the gapbetween the first member and the second member from above the object;exposing the substrate by the exposure light emitted from the emittingsurface via the liquid of the liquid immersion space; and moving thesecond member with respect to the first member in at least a portion ofexposure of the substrate.

According to a fourteenth aspect of the present invention, there isprovided an exposing method that exposes a substrate by exposure lightvia liquid between an emitting surface of an optical member emitting theexposure light and the substrate, including: forming a liquid immersionspace of the liquid on a substrate which is movable below the opticalmember by using a first liquid immersion member that includes a firstmember and a second member, the first member being disposed at at leasta portion of surrounding of an optical path of the exposure light, thesecond member being disposed so that at least a portion of the secondmember is capable of opposing the object below the first member andbeing movable with respect to the first member; exposing the substrateby the exposure light emitted from the emitting surface via the liquidof the liquid immersion space; moving the second member with respect tothe first member in at least a portion of the exposure of the substrate;and supplying gas from a gas supply part to at least a portion ofsurrounding of the liquid immersion space.

According to a fifteenth aspect of the present invention, there isprovided a method of manufacturing a device, including: exposing asubstrate using the exposing method according to any one of the ninth tofourteenth aspects; and developing the exposed substrate.

According to a sixteenth aspect of the present invention, there isprovided a program that causes a computer to execute a control of aliquid immersion exposure apparatus which exposes a substrate byexposure light via liquid between an emitting surface of an opticalmember emitting the exposure light and the substrate, wherein theprogram performs: forming a liquid immersion space of the liquid on asurface of the substrate by using a liquid immersion member thatincludes a first member and a second member, the first member includinga first part disposed at surrounding of an optical path of the exposurelight, a first opening part, through which the exposure light is able topass, and a first liquid supply part being provided at the first part ofthe first member, the first liquid supply part being disposed at atleast surrounding of the first opening part and being capable ofopposing the surface of the substrate, the second member including afirst liquid recovery part which is capable of opposing the surface ofthe substrate and being movable with respect to the first member outsidethe first part with respect to the optical path; exposing the substrateby the exposure light emitted from the emitting surface via the liquidof the liquid immersion space; and moving the second member with respectto the first member in at least a portion of exposure of the substrate.

According to a seventeenth aspect of the present invention, there isprovided a program that causes a computer to execute a control of aliquid immersion exposure apparatus which exposes a substrate byexposure light via liquid between an emitting surface of an opticalmember emitting the exposure light and the substrate, wherein theprogram performs: forming a liquid immersion space of the liquid on asurface of the substrate by using a liquid immersion member thatincludes a first member and a second member, the first member includinga first part disposed at surrounding of an optical path of exposurelight, a first opening part, through which the exposure light is able topass, being provided at the first part of the first member, the secondmember including a first liquid recovery part and a first gas supplypart and being movable with respect to the first member outside thefirst part with respect to the optical path, the first liquid recoverypart being capable of opposing the surface of the object, the first gassupply part being disposed outside the first liquid recovery part in aradial direction with respect to an optical axis of an optical memberand being capable of opposing the surface of the object; exposing thesubstrate by the exposure light emitted from the emitting surface viathe liquid of the liquid immersion space; and moving the second memberwith respect to the first member in at least a portion of exposure ofthe substrate.

According to an eighteenth aspect of the present invention, there isprovided a program that causes a computer to execute a control of aliquid immersion exposure apparatus which exposes a substrate byexposure light via liquid between an emitting surface of an opticalmember emitting the exposure light and the substrate, wherein theprogram performs: forming a liquid immersion space of the liquid on asurface of the substrate by using a liquid immersion member thatincludes a first member and a second member, the first member includinga first part disposed at surrounding of an optical path of the exposurelight, a first opening part, through which the exposure light is able topass, being provided at the first part of the first member, the secondmember including a first liquid recovery part and a second liquid supplypart and being movable with respect to the first member outside thefirst part with respect to the optical path, the first liquid recoverypart being capable of opposing the surface of the object, the secondliquid supply part being disposed between the optical path and the firstliquid recovery part in a radial direction with respect to an opticalaxis of the optical member and being capable of opposing the surface ofthe object; exposing the substrate by the exposure light emitted fromthe emitting surface via the liquid of the liquid immersion space; andmoving the second member with respect to the first member in at least aportion of exposure of the substrate.

According to a nineteenth aspect of the present invention, there isprovided a program that causes a computer to execute a control of aliquid immersion exposure apparatus which exposes a substrate toexposure light via liquid between an emitting surface of an opticalmember emitting the exposure light and the substrate, wherein theprogram performs: forming a liquid immersion space of the liquid on asurface of the substrate by using a liquid immersion member thatincludes a first member, a second member, and a second liquid recoverypart, the first member including a first part disposed at surrounding ofan optical path of the exposure light, a first opening part, throughwhich the exposure light is able to pass, being provided at the firstpart of the first member, the second member including a first liquidrecovery part and being movable with respect to the first member outsidethe first part with respect to the optical path, the first liquidrecovery part being capable of opposing a surface of the object, thesecond liquid recovery part being disposed at the first member and beingcapable of recovering at least a portion of liquid which has flowed in agap between the first member and the second member from above theobject; exposing the substrate by the exposure light emitted from theemitting surface via the liquid of the liquid immersion space; andmoving the second member with respect to the first member in at least aportion of exposure of the substrate.

According to a twentieth aspect of the present invention, there isprovided a program that causes a computer to execute a control of aliquid immersion exposure apparatus which exposes a substrate byexposure light via liquid between an emitting surface of an opticalmember emitting the exposure light and the substrate, wherein theprogram performs: forming a liquid immersion space of the liquid on asurface of a substrate by using a liquid immersion member that includesa first member, a second member, and a second liquid recovery part,wherein a gap between the first member and the second member includes afirst gap part having a first size, and a second gap part having asecond size which is disposed outside the first gap part with respect tothe optical axis of the optical member and is smaller than the firstsize, and the second liquid recovery part is capable of recoveringliquid from the first gap part, the first member including a first partdisposed at surrounding of an optical path of the exposure light, afirst opening part, through which the exposure light is able to pass,being provided at the first part of the first member, the second memberincluding a first liquid recovery part which is capable of opposing asurface of the object and being movable with respect to the first memberoutside the first part with respect to the optical path, the secondliquid recovery part being capable of recovering at least a portion ofliquid which has flowed in the gap between the first member and thesecond member from above the object; exposing the substrate by theexposure light emitted from the emitting surface via the liquid of theliquid immersion space; and moving the second member with respect to thefirst member in at least a portion of exposure of the substrate.

According to a twenty-first aspect of the present invention, there isprovided a program which causes a computer to execute a control of aliquid immersion exposure apparatus which exposes a substrate byexposure light via liquid between an emitting surface of an opticalmember emitting the exposure light and the substrate, wherein theprogram performs: forming a liquid immersion space of the liquid on asubstrate which is movable below the optical member by using a firstliquid immersion member that includes a first member and a secondmember, the first member being disposed at at least a portion ofsurrounding of an optical path of the exposure light, the second memberbeing disposed so that at least a portion of the second member iscapable of opposing the object below the first member and being movablewith respect to the first member; exposing the substrate by the exposurelight emitted from the emitting surface via the liquid of the liquidimmersion space; moving the second member with respect to the firstmember in at least a portion of the exposure of the substrate; andsupplying gas from a gas supply part to at least a portion ofsurrounding of the liquid immersion space.

According to a twenty-second of the present invention, there is provideda computer-readable recording medium on which the program according toany one of the sixteenth to twenty-first aspects is recorded.

According to the aspects of the present invention, occurrence ofexposure failure can be prevented. In addition, according to the aspectsof the present invention, occurrence of a defective device can beprevented.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a view showing an example of an exposure apparatus accordingto a first embodiment.

FIG. 2 is a side cross-sectional view showing an example of a liquidimmersion member according to the first embodiment.

FIG. 3 is a side cross-sectional view showing a portion of the liquidimmersion member according to the first embodiment.

FIG. 4 is a view of the liquid immersion member according to the firstembodiment as seen from below.

FIG. 5 is a view of a first member according to the first embodiment asseen from below.

FIG. 6 is a view for explaining an example of an operation of theexposure apparatus according to the first embodiment.

FIG. 7 is a view for explaining an example of an operation of a secondmember according to the first embodiment.

FIG. 8 is a view for explaining an example of the operation of theexposure apparatus according to the first embodiment.

FIG. 9 is a view for explaining an example of the operation of theexposure apparatus according to the first embodiment.

FIG. 10 is a view for explaining an example of the operation of theexposure apparatus according to the first embodiment.

FIG. 11 is a view showing an example of a second member according to asecond embodiment.

FIG. 12 is a view showing an example of the second member according tothe second embodiment.

FIG. 13 is a view showing an example of the second member according tothe second embodiment.

FIG. 14 is a view showing an example of the second member according tothe second embodiment.

FIG. 15 is a view showing an example of the second member according tothe second embodiment.

FIG. 16 is a view showing an example of the second member according tothe second embodiment.

FIG. 17 is a view showing an example of a liquid immersion memberaccording to a third embodiment.

FIG. 18 is a view showing an example of a liquid immersion memberaccording to a fourth embodiment.

FIG. 19 is a view showing an example of a liquid immersion memberaccording to a fifth embodiment.

FIG. 20 is a view showing an example of a liquid immersion memberaccording to a sixth embodiment.

FIG. 21 is a view for explaining an example of a liquid immersion memberaccording to a seventh embodiment.

FIG. 22 is a view showing an example of a liquid immersion memberaccording to an eighth embodiment.

FIG. 23 is a view showing an example of a liquid immersion memberaccording to a ninth embodiment.

FIG. 24 is a view for explaining an example of an operation of anexposure apparatus according to a tenth embodiment.

FIG. 25 is a side cross-sectional view showing a portion of a liquidimmersion member according to an eleventh embodiment.

FIG. 26 is a view of the liquid immersion member according to theeleventh embodiment as seen from below.

FIG. 27 is a view for explaining an example of an operation of theliquid immersion member according to the eleventh embodiment.

FIG. 28 is a side cross-sectional view showing a portion of the liquidimmersion member according to the eleventh embodiment.

FIG. 29 is a side cross-sectional view showing a portion of the liquidimmersion member according to the eleventh embodiment.

FIG. 30 is a side cross-sectional view showing a portion of the liquidimmersion member according to the eleventh embodiment.

FIG. 31 is a view showing an example of a substrate stage.

FIG. 32 is a flowchart for explaining an example of a method ofmanufacturing a device.

DESCRIPTION OF EMBODIMENTS

Hereinafter, embodiments of the present invention will be describedreferring to the drawings. However, the present invention is not limitedthereto. In the descriptions below, an XYZ rectangular coordinate systemis set, and a positional relationship of each portion will be describedwith reference to the XYZ rectangular coordinate system. A predetermineddirection in a horizontal surface is set to an X axis direction, adirection orthogonal to the X axis direction in the horizontal surfaceis set to a Y axis direction, and a direction (that is, a verticaldirection) orthogonal to each of the X axis direction and the Y axisdirection is set to a Z axis direction. Moreover, the rotation(inclination) directions around the X axis, the Y axis, and the Z axisare set to the θX direction, the θY direction, and the θZ direction.

First Embodiment

A first embodiment will be described. FIG. 1 is a schematicconfiguration view showing an example of an exposure apparatus EXaccording to the first embodiment. The exposure apparatus EX of thepresent embodiment is a liquid immersion exposure apparatus whichexposes a substrate P via a liquid LQ using exposure light EL. In thepresent embodiment, a liquid immersion space LS is formed so that anoptical path of the exposure light EL which is radiated to the substrateP is filled with the liquid LQ. The liquid immersion space means aportion (space or region) which is filled with the liquid. The substrateP is exposed by the exposure light EL via the liquid LQ in the liquidimmersion space LS. In the present embodiment, water (pure water) isused as the liquid LQ.

For example, the exposure apparatus EX of the present embodiment is anexposure apparatus which includes a substrate stage and a measurementstage as disclosed in U.S. Pat. No. 6,897,963, European PatentApplication, Publication No. 1,713,113, or the like.

In FIG. 1, the exposure apparatus EX includes: a mask stage 1 which ismovable while holding a mask M; a substrate stage 2 which is movablewhile holding a substrate P; a measurement stage 3 which does not holdthe substrate P, and which is movable while mounting a measurementmember (measurement instrument) C which measures the exposure light EL;a measurement system 4 which measures positions of the substrate stage 2and the measurement stage 3, an illumination system IL which illuminatesthe mask M with the exposure light EL; a projection optical system PLwhich projects an image of a pattern of the mask M which is illuminatedwith the exposure light EL to the substrate P; a liquid immersion member5 which forms the liquid immersion space LS of a liquid LQ; a controller6 which controls an operation of the entire exposure apparatus EX; and astorage apparatus 7 which is connected to the controller 6 and storesvarious information with respect to the exposure.

Moreover, the exposure apparatus EX includes a reference frame 8A whichsupports the projection optical system PL and various measurementsystems including the measurement system 4, an apparatus frame 8B whichsupports the reference frame 8A, and a vibration isolator 10 which isdisposed between the reference frame 8A and the apparatus frame 8B, andsuppresses transmission of vibration from the apparatus frame 8B to thereference frame 8A. The vibration isolator 10 includes a springapparatus or the like. In the present embodiment, the vibration isolator10 includes a gas spring (for example, an air mount). In addition,either a detection system which detects an alignment mark of thesubstrate P or a detection system which detects the position of thesurface of an object such as the substrate P, or both detection systemsmay be supported by the reference frame 8A.

Moreover, the exposure apparatus EX includes a chamber apparatus 9 whichadjusts an environment (at least one of temperature, humidity, pressure,and a degree of cleanness) of a space CS to which the exposure light ELadvances. The chamber apparatus 9 includes an air conditioner 9S whichsupplies a gas GS to the space CS. The air conditioner 9S supplies thegas GS, in which the temperature, the humidity, and the degree ofcleanness are adjusted, to the space CS.

At least the projection optical system PL, the liquid immersion member5, the substrate stage 2, and the measurement stage 3 are disposed atthe space CS. In the present embodiment, at least a portion of the maskstage 1 and the illumination system IL is also disposed at the space CS.

The mask M includes a reticle on which a device pattern projected to thesubstrate P is formed. For example, the mask M includes a transmissiontype mask which includes a transparent plate such as a glass plate, anda pattern formed on the transparent plate using a light-shieldingmaterial such as chromium. Moreover, a reflection type mask may be usedas the mask M.

The substrate P is a substrate used to manufacture a device. Forexample, the substrate P includes a base material such as asemiconductor wafer and a photosensitive film which is formed on thebase material. The photosensitive film is a film of a photosensitivematerial (photoresist). Moreover, the substrate P may include otherfilms in addition to the photosensitive film. For example, the substrateP may include an antireflection film and a protective film (top coatfilm) which protects the photosensitive film.

The illumination system IL radiates the exposure light EL to anillumination region IR. The illumination region IR includes positionswhich can be radiated with the exposure light EL emitted from theillumination system IL. The illumination system IL illuminates at leasta portion of the mask M disposed at the illumination region IR by theexposure light EL having a uniform illumination distribution. Forexample, as for the exposure light EL which is emitted from theillumination system IL, far-ultraviolet light (DUV light) such as abright line (g-line, h-line, i-line) emitted from a mercury lamp and KrFexcimer laser light (248 nm in wavelength), ArF excimer laser light (193nm in wavelength), vacuum-ultraviolet light (VUV light) such as F₂ laserlight (157 nm in wavelength), and the like are used. In the presentembodiment, as for the exposure light EL, ArF excimer laser light, whichis ultraviolet light (vacuum-ultraviolet light), is used.

The mask stage 1 is movable in a state where it holds the mask M. Forexample, the mask stage 1 is moved by an operation of a driving system11 which includes a planar motor as disclosed in U.S. Pat. No.6,452,292. In the present embodiment, the mask stage 1 is movable in sixdirections of the X axis, the Y axis, the Z axis, the θX, the θY, andthe θZ by the operation of the driving system 11. Moreover, the drivingsystem 11 may not include a planar motor. The driving system 11 mayinclude a linear motor.

The projection optical system PL radiates the exposure light EL to aprojection region PR. The projection region PR includes positions whichcan be radiated with the exposure light EL emitted from the projectionoptical system PL. The projection optical system PL projects the imageof the pattern of the mask M on at least a portion of the substrate Pdisposed at the projection region PR by a predetermined projectionmagnification. In the present embodiment, the projection optical systemPL is a reduction system. The projection magnification of the projectionoptical system PL is ¼. In addition, the projection magnification of theprojection optical system PL may be ⅕, ⅛, or the like. Moreover, theprojection optical system PL may be either an equal magnification systemor an enlargement system. In the present embodiment, the optical axis ofthe projection optical system PL is parallel to the Z axis. Theprojection optical system PL may be any of a refraction system whichdoes not include a reflective optical element, a reflection system whichdoes not include a refractive optical element, or a reflectiverefraction system which includes the reflective optical element and therefractive optical element. The projection optical system PL may formeither an inverted image or an erected image.

The projection optical system PL includes a terminal optical element 13which includes an emitting surface 12 from which the exposure light ELis emitted. The emitting surface 12 emits the exposure light EL towardthe image surface of the projection optical system PL. The terminaloptical element 13 is an optical element nearest to the image surface ofthe projection optical system PL among the plurality of optical elementsof the projection optical system PL. The projection region PR includespositions which can be radiated with the exposure light EL emitted fromthe emitting surface 12. In the present embodiment, the emitting surface12 faces the −Z direction. The exposure light EL emitted from theemitting surface 12 advances in the −Z direction. The emitting surface12 is parallel to the XY plane. Moreover, the emitting surface 12 facingthe −Z direction may have a convex surface or a concave surface. Inaddition, the emitting surface 12 may be inclined with respect to the XYplane and may include a curved surface. In the present embodiment, theoptical axis AX of the terminal optical element 13 is parallel to the Zaxis.

With respect to the direction parallel to the optical axis AX of theterminal optical element 13, the emitting surface 12 side is at the −Zside, and the incident surface side is at the +Z side. With respect tothe direction parallel to the optical axis of the projection opticalsystem PL, the image surface side of the projection optical system PL isat the −Z side, and the object surface side of the projection opticalsystem PL is at the +Z side. In the present embodiment, the emittingsurface 12 side (image surface side) is at the lower side (lowerportion), and the incident surface side (object surface side) is at theupper side (upper portion).

The substrate stage 2 is movable in the XY plane, which includespositions (projection region PR) which can be radiated with the exposurelight EL from the emitting surface 12, in a state where the substratestage holds the substrate P. The measurement stage 3 is movable in theXY plane, which includes positions (projection region PR) which can beradiated with the exposure light EL from the emitting surface 12, in astate where a measurement member (measurement instrument) C is mountedon the measurement stage. Each of the substrate stage 2 and themeasurement stage 3 is movable on a guide surface 14G of a base member14. The guide surface 14G and the XY plane are substantially parallel toeach other.

The substrate stage 2 includes a first holding part which releasablyholds the substrate P and a second holding part which is disposed at thesurrounding of the first holding part and releasably holds a covermember T as disclosed in, for example, United States Patent Application,Publication No. 2007/0177125, United States Patent Application,Publication No. 2008/0049209, and the like. The first holding part holdsthe substrate P so that the surface (upper surface) of the substrate Pand the XY plane are substantially parallel to each other. The uppersurface of the substrate P held by the first holding part and the uppersurface of the cover member T held by the second holding part aredisposed at substantially the same plane. With respect to the Z axisdirection, the distance between the emitting surface 12 and the uppersurface of the substrate P held by the first holding part issubstantially the same as the distance between the emitting surface 12and the upper surface of the cover member T held by the second holdingpart.

Moreover, with respect to the Z axis direction, the distance between theemitting surface 12 and the upper surface of the substrate P beingsubstantially the same as the distance between the emitting surface 12and the upper surface of the cover member T includes a difference of thedistance between the emitting surface 12 and the upper surface of thesubstrate P and the distance between the emitting surface 12 and theupper surface of the cover member T being within 10% of the distance (aso-called working distance) between the emitting surface 12 and theupper surface of the substrate P when the substrate P is exposed, forexample. In addition, the upper surface of the substrate P held by thefirst holding part and the upper surface of the cover member T held bythe second holding part may not be disposed on substantially the sameplane. For example, with respect to the Z axis direction, the positionof the upper surface of the substrate P and the position of the uppersurface of the cover member T may be different from each other. Forexample, there may be a step between the upper surface of the substrateP and the upper surface of the cover member T. In addition, the uppersurface of the cover member T may be inclined with respect to the uppersurface of the substrate P. The upper surface of the cover member T mayinclude a curved surface.

The substrate stage 2 and the measurement stage 3 are moved by anoperation of a driving system 15 which includes a planar motor asdisclosed in, for example, U.S. Pat. No. 6,452,292. The driving system15 includes a mover 2C which is disposed at the substrate stage 2, amover 3C which is disposed at the measurement stage 3, and a stator 14Mwhich is disposed at the base member 14. Each of the substrate stage 2and the measurement stage 3 is movable on a guide surface 14G in sixdirections of the X axis, the Y axis, the Z axis, the θX, the θY, andthe θZ directions by the operation of the driving system 15. Moreover,the driving system 15 may not include a planar motor. The driving system15 may include a linear motor.

The measurement system 4 includes an interferometer system. Theinterferometer system includes a unit which radiates measurement lightto a measurement mirror of the substrate stage 2 and a measurementmirror of the measurement stage 3 and measures the positions of thesubstrate stage 2 and the measurement stage 3. In addition, for example,the measurement system may include an encoder system disclosed in UnitedStates Patent Application, Publication No. 2007/0288121. Moreover, themeasurement system 4 may include only one of the interferometer systemand the encoder system.

When exposure processing of the substrate P is performed, or whenpredetermined measurement processing is performed, the controller 6performs position controls of the substrate stage 2 (substrate P) andthe measurement stage 3 (measurement member C) based on the measurementresults of the measurement system 4.

Next, the liquid immersion member 5 according to the present embodimentwill be described. In addition, the liquid immersion member may also bereferred to as a nozzle member. FIG. 2 is a cross-sectional view of theterminal optical element 13 and the liquid immersion member 5 parallelto the XZ plane. FIG. 3 is a view in which a portion of FIG. 2 isenlarged. FIG. 4 is a view of the liquid immersion member 5 as seen frombelow (−Z side). FIG. 5 is a view of a first member 21 of the liquidimmersion member 5 as seen from below (−Z side).

The terminal optical element 13 includes the emitting surface 12 facingthe −Z axis direction and an outer surface 131 which is disposed at thesurrounding of the emitting surface 12. The exposure light EL is emittedfrom the emitting surface 12. The exposure light EL is not emitted fromthe outer surface 131. The exposure light EL passes through the emittingsurface 12 and does not pass through the outer surface 131. The outersurface 131 is a non-emitting surface from which the exposure light ELis not emitted. In the present embodiment, the outer surface 131 isinclined upwardly and outwardly in a radial direction with respect tothe optical path AX of the terminal optical element 13.

The liquid immersion member 5 forms a liquid immersion space LS of theliquid LQ above the surface (upper surface) of the object which ismovable below the terminal optical element 13.

The object which is movable below the terminal optical element 13 ismovable in the XY plane which includes the position opposite to theemitting surface 12. The surface (upper surface) of the object is ableto be opposite to the emitting surface 12 and is capable of beingdisposed at the projection region PR. The object is movable below theliquid immersion member 5 and is capable of being opposite to the liquidimmersion member 5.

In the present embodiment, the object includes at least one of at leasta portion of the substrate stage 2 (for example, the cover member T ofthe substrate stage 2), the substrate P which is held by the substratestage 2 (first holding part), and the measurement stage 3.

In the exposure of the substrate P, the liquid immersion space LS isformed so that the optical path K of the exposure light EL between theemitting surface 12 of the terminal optical element 13 and the substrateP is filled with the liquid LQ. When the exposure light EL is radiatedto the substrate P, the liquid immersion space LS is formed so that onlya portion of the surface region of the substrate P which includes theprojection region PR is covered by the liquid LQ.

In descriptions below, the object is defined as the substrate P.Moreover, as described above, the object may be at least one of thesubstrate stage 2 and the measurement stage 3, and the object may be oneother than the substrate P, the substrate stage 2, and the measurementstage 3.

The liquid immersion space LS may be formed over two objects. Forexample, the liquid immersion space LS may be formed over the covermember T of the substrate stage 2 and the substrate P. The liquidimmersion space LS may be formed over the substrate stage 2 and themeasurement stage 3.

The liquid immersion space LS is formed so that the optical path K ofthe exposure light EL emitted from the emitting surface 12 of theterminal optical element 13 is filled with the liquid LQ. At least aportion of the liquid immersion space LS is formed in a space betweenthe terminal optical element 13 and the substrate P (object). At least aportion of the liquid immersion space LS is formed in a space betweenthe liquid immersion member 5 and the substrate P (object).

The liquid immersion member 5 includes the first member 21 including afirst part 211 disposed at at least a portion of the surrounding of theoptical path of the exposure light EL, and the second member 22 in whichat least a portion is disposed outside the first part 211 with respectto the optical path K. The second member 22 is movable with respect tothe first member 21 outside the first part 211 with respect to theoptical path of the exposure light EL.

In the present embodiment, the first part 211 is disposed at at least aportion of the surrounding of the optical path K of the exposure lightEL emitted from the emitting surface 12. Moreover, the first part 211may be disposed at at least a portion of the surrounding of the opticalpath K of the exposure light EL emitted from the emitting surface 12,and may be disposed at at least a portion of the surrounding of theoptical path KL (the optical path KL of the exposure light EL whichpasses through the terminal optical element 13) of the exposure light ELin the terminal optical element 13. In other words, in the presentembodiment, the optical path of the exposure light EL may include theoptical path K of the exposure light EL between the emitting surface 12and the substrate P (object), and may also include the optical path KLof the exposure light EL in the terminal optical element 13. The firstpart 211 may be a portion which is disposed at at least a portion of thesurrounding of the optical path K, and may be a portion which isdisposed at at least a portion of the surrounding of the optical path Kand the optical path KL (optical path K and the terminal optical element13).

The first part 211 of the first member 21 includes a lowermost part ofthe first member 21. The first part 211 of the first member 21 includesa portion closest to the surface (upper surface) of the substrate P(object) of the first member 21. In the present embodiment, the firstpart 211 of the first member 21 is disposed below the emitting surface12 of the terminal optical element 13. At least a portion of the firstpart 211 may be disposed above the emitting surface 12.

The second member 22 is a movable member which is able to move. Theterminal optical element 13 does not substantially move. The firstmember 21 also does not substantially move. The first member 21 does notsubstantially move with respect to the optical element 13.

The first member 21 is disposed so as not to contact the terminaloptical element 13. A gap is formed between the terminal optical element13 and the first member 21. The second member 22 is disposed so as notto contact the terminal optical element 13 and the first member 21. Agap is formed between the first member 21 and the second member 22. Thesecond member 22 moves so as not to contact the terminal optical element13 and the first member 21.

The substrate P (object) is able to be opposite to at least a portion ofthe terminal optical element 13 via the gap. The substrate P (object) isable to be opposite to at least a portion of the first member 21 via thegap. The substrate P (object) is able to be opposite to at least aportion of the second member 22 via the gap. The substrate P (object) ismovable below the terminal optical element 13, the first member 21, andthe second member 22.

At least a portion of the first member 21 is opposite to the terminaloptical element 13 via the gap. In the present embodiment, the firstmember 21 is opposite to the outer surface 131, and is not opposite tothe emitting surface 12.

At least a portion of the second member 22 is opposite to the firstmember 21 via the gap. The second member 22 is not opposite to theterminal optical element 13. The first member 21 is disposed between thesecond member 22 and the terminal optical element 13.

The first member 21 includes the first part 211 which is disposed at atleast a portion of the surrounding of the optical path K, and a secondpart 212 which is disposed at at least a portion of the surrounding ofthe terminal optical element 13. The second part 212 is disposed abovethe first part 211. In the present embodiment, the first member 21 is anannular member. The first part 211 is disposed at the surrounding of theoptical path K. The second member 212 is disposed at the surrounding ofthe terminal optical element 13.

The first member 21 includes a first opening part 23 through which theexposure light EL emitted from the emitting surface 12 is able to pass,a lower surface 24 which is disposed at the surrounding of the firstopening part 23 and faces the −Z axis direction, an inner surface 25 inwhich at least a portion is opposite to the outer surface 131 of theterminal optical element 13, an outer surface 26 which faces thedirection opposite to the inner surface 25, an upper surface 27 whichfaces the +Z axis direction, a lower surface 28 which faces thedirection opposite to the upper surface 27, and an outer surface 29which faces outward in the radial direction with respect to the opticalaxis AX.

The lower surface 24 is disposed at the surrounding of the lower end ofthe first opening part 23. The surface (upper surface) of the substrateP (object) is able to be opposite to the lower surface 24. The lowersurface 24 does not face the second member 22. The first opening part 23and the lower surface 24 are provided at the first part 211.

At least a portion of the inner surface 25 is opposite to the outersurface 131 via a gap. A portion (the lower portion) of the innersurface 25 is disposed at the surrounding of the optical path K. Aportion (the upper portion) of the inner surface 25 is disposed at thesurrounding of the terminal optical element 13. The first part 211includes a portion (the lower portion) of the inner surface 25, and thesecond part 212 includes a portion (the upper portion) of the innersurface 25.

At least a portion of the outer surface 26 is opposing the second member22 via a gap. The first part 211 includes a portion (the lower portion)of the outer surface 26, and the second part 212 includes a portion (theupper portion) of the outer surface 26.

The lower surface 24 is disposed so that the lower end of the innersurface 25 and the lower end of the outer surface 26 are connected toeach other. An inner edge of the lower surface 24 is connected to thelower end of the inner surface 25. An outer edge of the lower surface 24is connected to the lower end of the outer surface 26.

The upper surface 27 faces the space CS. The upper surface 27 does notface the second member 22. The upper surface 27 is connected to theupper end of the inner surface 25. The upper surface 27 is disposed atthe surrounding of the upper end of the inner surface 25. The secondpart 212 includes the upper surface 27.

At least a portion of the lower surface 28 is opposite to the secondmember 22 via a gap. The lower surface 28 is connected to the upper endof the outer surface 26. The lower surface 28 is disposed at thesurrounding of the upper end of the upper surface 26. The second part212 includes the lower surface 28.

The outer surface 29 faces the space CS. The outer surface 29 does notface the second member 22. The outer surface 29 is disposed so that theouter edge of the upper surface 27 and the outer edge of the lowersurface 28 are connected to each other. The second member 212 includesthe outer surface 29.

Each of the lower surface 24, the inner surface 25, the outer surface26, the upper surface 27, the lower surface 28, and the outer surface 29is a non-recovery part which is not able to recover the liquid LQ. Thelower surface 24 is able to hold the liquid LQ between the lower surface24 and the substrate P (object). The inner surface 25 is able to holdthe liquid LQ between the inner surface 25 and the terminal opticalelement 13. The outer surface 26 and the lower surface 28 are able tohold the liquid LQ between the outer surface 26 and the lower surface28, and the second member 22.

In the descriptions below, a portion of the first member 21 includingthe lower surface 24, the inner surface 25, and the outer surface 26 isappropriately referred to as an surrounding part 213, and a portion ofthe first member 21 including the upper surface 27, the lower surface28, and the outer surface 29 is appropriately referred to as an upperplate part 214.

At least a portion of the surrounding part 213 is opposite to the outersurface 131 of the terminal optical element 13. The enclosing part 213is disposed at the surrounding of the optical path K and the terminaloptical element 13 (optical path K). The upper plate part 214 isdisposed above the surrounding part 213. The upper plate part 214 isconnected to the upper end of the surrounding part 213. The surroundingpart 213 includes the first part 211. The surrounding part 213 includesa portion of the second part 212. The upper plate part 214 includes aportion of the second part 212. The second member 22 is disposed belowthe upper plate part 214 (second part 212). In addition, the surroundingpart 213 may not include the second part 212. In addition, the upperplate part 214 may include the first part 211.

The lower surface 24 is disposed below the emitting surface 12. Thelower surface 24 is substantially parallel to the plane (XY plane)perpendicular to the optical axis AX (Z axis) of the terminal opticalelement 13.

The inner surface 25 is disposed above the lower surface 24. At least aportion of the inner surface 25 is inclined upwardly and outwardly in aradial direction with respect to the optical axis AX. In the presentembodiment, the inner surface 25 is connected to the inner edge of thelower surface 24, and includes a region 251 which is substantiallyparallel to the optical axis AX (Z axis), and a region 252 which isdisposed above the region 251 and is inclined upwardly and outwardly inthe radial direction with respect to the optical axis AX. With respectto the Z axis direction, a size of the region 252 is larger than a sizeof the region 251.

The outer surface 26 is disposed above the lower surface 24. At least aportion of the outer surface 26 is inclined upwardly and outwardly inthe radial direction with respect to the optical axis AX. The outersurface 26 is disposed outside the lower surface 24 in the radialdirection with respect to the optical axis AX.

The upper surface 27 is disposed above the lower surface 24, the innersurface 25, the outer surface 26, and the lower surface 28. The uppersurface 27 is substantially parallel to the XY plane.

The lower surface 28 is disposed above the lower surface 24 and theouter surface 26. The lower surface 28 is disposed outside the lowersurface 24 and the outer surface 26 in the radial direction with respectto the optical axis AX. A step is formed between the lower surface 24and the lower surface 28. The lower surface 28 is substantially parallelto the XY plane.

The second member 22 is disposed to surround at least a portion of thefirst part 211 and the second part 212. Moreover, the second member 22may be disposed to surround at least a portion of the first part 211,and may not surround the second part 212. In the present embodiment, thesecond member 22 is an annular member.

In the present embodiment, the second member 22 is disposed outside thesurrounding part 213. At least a portion of the second member 22 isdisposed below the upper plate part 214. In other words, at least aportion of the second member 22 is disposed between the upper plate part214 and the substrate P (object). In the present embodiment, the secondmember 22 is disposed at a space outside the surrounding part 213 belowthe upper plate part 214. The second member 22 moves in the spaceoutside the surrounding part 213 below the upper plate part 214.

The second member 22 includes a second opening part 30 through which theemitting light EL emitted from the emitting surface 12 is able to pass,a lower surface 31 which is disposed at the surrounding of the secondopening part 30 and faces the −Z axis direction, an inner surface 32 inwhich at least a portion is opposite to the outer surface 26 of thefirst member 21, a upper surface 33 in which at least a portion facesthe +Z axis direction, and an outer surface 34 which faces outward inthe radial direction with respect to the optical axis AX.

In the XY plane, the second opening part 30 is larger than the firstopening part 23. At least a portion of the optical path K and the firstmember 21 is disposed inside the second opening part 30. In the presentembodiment, the first part 211 of the first member 21 is disposed insidethe second opening part 30.

In the descriptions below, an opening part of one end (lower end) of agap between the first member 21 and the second member 22 isappropriately referred to as an opening part 301. The opening part 301is disposed between the first part 211 and the second member 22. Theopening part 301 is disposed between the outer edge of the lower surface24 and the inner edge of the lower surface 31. The one end (opening part301) of the gap between the first member 21 and the second member 22 isdisposed to be opposite to the surface (upper surface) of the substrateP (object). The liquid LQ on the substrate P (object) is able to flowinto the gap between the first member 21 and the second member 22 fromthe opening part 301.

The lower surface 31 is disposed at the surrounding of the lower end ofthe second opening part 30 (opening part 301). In the presentembodiment, the lower surface 31 is disposed at the surrounding of thelower surface 24. The surface (upper surface) of the substrate P(object) is able to be opposite to the lower surface 31. The openingpart 301 is disposed between the lower surface 24 and the lower surface31.

At least a portion of the inner surface 32 is opposite to the firstmember 21 via a gap. In the present embodiment, at least a portion ofthe inner surface 32 is opposite to the outer surface 26 via a gap. Atleast a portion of the inner surface 32 is disposed at the surroundingof the surrounding part 213. The inner edge of the lower surface 31 andthe lower end of the inner surface 32 are connected to each other.

At least a portion of the upper surface 33 is opposite to the firstmember 21 via a gap. The upper surface 33 is connected to the upper endof the inner surface 32. The upper surface 33 is disposed at thesurrounding of the upper end of the inner surface 32.

The outer surface 34 faces the space CS. The outer surface 34 does notface the first member 21. The outer surface 34 is disposed to connectthe outer edge of the upper surface 33 and the outer edge of the lowersurface 31.

Each of the lower surface 31, the inner surface 32, the upper surface33, and the outer surface 34 is a non-recovery part which is not able torecover the liquid LQ. The lower surface 31 is able to hold the liquidLQ between the lower surface 31 and the substrate P (object). The innersurface 32 and the upper surface 33 is able to hold the liquid LQbetween the inner surface 32 and the upper surface 33, and the firstmember 21.

The lower surface 31 is disposed below the emitting surface 12. Thelower surface 31 is substantially parallel to the plane (XY plane)perpendicular to the optical axis AX (Z axis) of the terminal opticalelement 13. In the present embodiment, the lower surface 24 and thelower surface 31 are disposed on substantially a same plane (are flushwith each other).

The inner surface 32 is disposed above the lower surface 31. At least aportion of the inner surface 32 is inclined upwardly and outwardly inthe radial direction with respect to the optical axis AX. In the presentembodiment, the inner surface 32 is connected to the inner edge of thelower surface 31, and includes a region 321 which is substantiallyparallel to the optical axis AX (Z axis), and a region 322 which isdisposed above the region 321 and is inclined upwardly and outwardly inthe radial direction with respect to the optical axis AX. With respectto the Z axis direction, a size of the region 322 is larger than a sizeof the region 321.

The upper surface 33 is disposed above the lower surface 31 and theouter surface 32. The upper surface 33 is disposed outside the innersurface 32 in the radial direction with respect to the optical axis AX.In the present embodiment, the upper surface 33 includes a region 331which is connected to the upper end of the inner surface 32, and aregion 332 which is positioned outside the region 331 in the radialdirection with respect to the optical axis AX and is disposed above theregion 331. In the present embodiment, a size of the region 332 issmaller than a size of the region 331 in the radial direction withrespect to the optical axis AX. The region 331 is substantially parallelto the XY plane. The region 332 is substantially parallel to the XYplane. A step is formed between the region 331 and the region 332.

In the present embodiment, the second member 22 includes a protrudingpart (wall part) 333 at the surrounding of the region 331. The region332 includes the upper surface of the protruding part 333.

As shown in FIG. 4, the first opening part 23 has substantially thecircular shape in the XY plane. The second opening part 30 also has asubstantially circular shape. The opening part 301 has an annular shape(circular annular shape).

As shown in FIG. 4, in the XY plane, an outer shape of the first member21 has substantially the circular shape. The outer shape of the secondmember 22 is rectangular. The region 332 has an annular shape (circularannular shape).

In the descriptions below, a space to which the emitting surface 12faces is appropriately referred to as an optical path space SPK. Theoptical path space SPK is a space at the emitting surface 12 side. Theoptical path space SPK is a space between the terminal optical element13 and the substrate P (object). The optical path space SPK is a spacewhich includes the optical path K between the emitting surface 12 andthe upper surface of the substrate P (object).

Moreover, a space to which the lower surface 24 faces is appropriatelyreferred to as a first space SP1. The first space SP1 is a space of thelower surface 24 side. The first space SP1 is a space between the firstmember 21 and the substrate P (object). The first space SP1 is a spacebetween the lower surface 24 and the upper surface of the substrate P(object).

In addition, a space to which the lower surface 31 faces isappropriately referred to as a second space SP2. The second space SP2 isa space at the lower surface 31 side. The second space SP2 is a spacebetween the second member 22 and the substrate P (object). The secondspace SP2 is a space between the lower surface 31 and the upper surfaceof the substrate P (object).

Moreover, in the present embodiment, a size in the Z axis direction ofthe second space SP2, that is, a distance between the lower surface 31and the upper surface of the substrate P (object) in the Z axisdirection is 0.1 mm to 0.2 mm.

In addition, a space to which the inner surface 25 faces isappropriately referred to as a third space SP3. The third space SP3 is aspace at the inner surface 25 side. The third space SP3 is a spacebetween the first member 21 and the terminal optical element 13. Thethird space SP3 is a space between the inner surface 25 and the outersurface 131.

In addition, a space to which the inner surface 32 and the upper surface33 face is appropriately referred to as a fourth space SP4. The fourthspace SP4 is a space to which the inner surface 32 and the upper surface33 face. The fourth SP4 is a gap (space) between the first member 21 andthe second member 22. The fourth space SP4 is a space between the innersurface 32 and the upper surface 33, and the outer surface 26 and thelower surface 28.

Moreover, in the fourth space SP4, a space between the surrounding part213 (first part 211) and the second member 22 is appropriately referredto as a space SP4a, and a space SP4 between the upper plate part 214(second part 212) and the second member 22 is appropriately referred toas a space SP4b.

In the present embodiment, the gap (fourth space SP4) between the firstmember 21 and the second member 22 includes a first gap part having asize Ha, and a second gap part which is disposed outside the first gappart with respect to the optical axis AX of the terminal optical element13 and which has a size Hb smaller than the size Ha.

In the present embodiment, the first gap part includes a gap (space)between the region 331 and the lower surface 28. The second gap partincludes a gap (space) between the region 332 and the lower surface 28.The lower surface 28 of the first member 21 defining the second gap partand the region 332 of the second member 22 opposite to the lower surface28 are substantially parallel to the XY plane.

In the present embodiment, at least a portion of one or both of thesurface of the first member 21 and the surface of the second member 22facing the gap (fourth space SP4) between the first member 21 and thesecond member 22 may have a liquid repellent property with respect tothe liquid LQ. For example, the upper surface 33 of the second member 22may have the liquid repellent property with respect to the liquid LQ.The lower surface 28 of the first member 21 may have the liquidrepellent property with respect to the liquid LQ. For example, thesurface having the liquid repellent property with respect to the liquidLQ includes a surface in which a contact angle with respect to theliquid LQ is 90° or more. Moreover, for example, the surface having theliquid repellent property with respect to the liquid LQ may include asurface in which the contact angle with respect to the liquid LQ is 100°or more, a surface in which the contact angle is 110° or more, or asurface in which the contact angle is 120° or more. The surface havingthe liquid repellent property with respect to the liquid LQ includes asurface of a film having the liquid repellent property with respect tothe liquid LQ. For example, the film may be a resin film which includesfluorine. For example, the upper surface 33 may be a surface of theresin film including fluorine. The lower surface 28 may be a surface ofthe resin film including fluorine. The film having the liquid repellentproperty with respect to the liquid LQ may be a film including Tetrafluoro ethylene-perfluoro alkylvinyl ether copolymer (PFA). The filmhaving the liquid repellent property with respect to the liquid LQ maybe a film including Poly tetra fluoro ethylene (PTFE).

In the present embodiment, a portion of an interface LG of the liquid LQin the liquid immersion space LS is formed between the second member 22and the substrate P (object). A portion of the interface LG of theliquid LQ in the liquid immersion space LS is formed between the firstmember 21 and the second member 22. A portion of the interface LG of theliquid LQ in the liquid immersion space LS is formed between theterminal optical element 13 and the first member 21.

In the descriptions below, the interface LG which is formed between thesecond member 22 and the substrate P (object) is appropriately referredto as a first interface LG1. The interface LG of the liquid LQ which isformed between the first member 21 and the second member 22 isappropriately referred to as a second interface LG2. The interface LGwhich is formed between the terminal optical element 13 and the firstmember 21 is appropriately referred to as a third interface LG3.

The liquid immersion member 5 includes a first liquid supply part 41, asecond liquid supply part 42, and a third liquid supply part 43 capableof supplying the liquid LQ, a first liquid recovery part 51, a secondliquid recovery part 52, and a third liquid recovery part 53 capable ofrecovering the liquid LQ, and a first gas supply part 61 capable ofsupplying gas.

The first liquid supply part 41 is disposed at the first part 211 of thefirst member 21. The first liquid supply part 41 is disposed at at leasta portion of the surrounding of the first opening part 23. The firstliquid supply part 41 is disposed to be opposite to the upper surface ofthe substrate P (object). The first liquid supply part 41 is disposed toface the first space SP1. The first liquid supply part 41 is disposed atthe lower surface 24.

In the present embodiment, the first liquid supply part 41 is disposedat the lower surface 24, and includes an opening (first liquid supplyport) 41M capable of supplying the liquid LQ. As shown in FIG. 4, aplurality of first liquid supply ports 41M are disposed at the lowersurface 24. The plurality of first liquid supply ports 41M are disposedto surround the optical path K. The plurality of first liquid supplyports 41M are disposed with intervals at the surrounding of the opticalpath K. In the present embodiment, the plurality of first liquid supplyports 41M are disposed along a circular virtual line in the XY plane.

Each of the first liquid supply parts 41 (first liquid supply port 41M)is connected to a liquid supply apparatus via a supply channel 41R whichis formed inside the first member 21. The liquid supply apparatusincludes a filter apparatus which cleans the liquid LQ to be supplied, atemperature adjustment apparatus which is able to adjust the temperatureof the liquid LQ to be supplied, or the like, and the liquid supplyapparatus is able to supply a cleaned liquid LQ in which the temperatureis adjusted. The liquid LQ discharged from the liquid supply apparatusis sent to the first liquid supply part 41 via the supply channel 41R.The first liquid supply part 41 supplies the liquid LQ supplied from theliquid supply apparatus via the supply channel 41R to the first spaceSP1.

The second liquid supply part 42 is disposed at the second member 22.The second liquid supply part 42 is disposed at at least a portion ofthe surrounding of the second opening part 30. The second liquid supplypart 42 is disposed to be opposite to the upper surface of the substrateP (object). The second liquid supply part 42 is disposed to face thesecond space SP 2. The second liquid supply part 42 is disposed at thelower surface 31.

In the present embodiment, the second liquid supply part 42 is disposedat the lower surface 31, and includes an opening (second liquid supplyport) 42M which is able to supply the liquid LQ. As shown in FIG. 4, aplurality of the second liquid supply ports 42M are disposed at thelower surface 31. The plurality of second liquid supply ports 42M aredisposed to surround the optical path K. The second liquid supply ports42M are disposed with intervals at the surrounding of the optical pathK. In the present embodiment, the plurality of second liquid supplyparts 42M are disposed along a rectangular virtual line in the XY plane.

The second liquid supply part 42 (second liquid supply port 42M) isconnected to the liquid supply apparatus via a supply channel 42R whichis formed inside the second member 22. The liquid LQ discharged from theliquid supply apparatus is sent to the second liquid supply part 42 viathe supply channel 42R. The second liquid supply part 42 supplies theliquid LQ supplied from the liquid supply apparatus via the supplychannel 42R to the second space SP2.

The third liquid supply part 43 is disposed at the first member 21. Inthe present embodiment, the third liquid supply part 43 is disposed atthe first part 211 of the first member 21. The third liquid supply part43 is disposed at a least a portion of the surrounding of the opticalpath K. The third liquid supply part 43 is disposed to face the opticalpath K. The third liquid supply part 43 is disposed to face the opticalpath space SPK. The third liquid supply part 43 is disposed at the innersurface 25.

In the present embodiment, the third liquid supply part 43 is disposedat the inner surface 25, and includes an opening (third liquid supplyport) 43M which is able to supply the liquid LQ. A plurality of thethird liquid supply ports 43M are disposed at the inner surface 25. Thethird liquid supply ports 43M may be disposed at each of the +X side andthe −X side with respect to the optical path K. The third liquid supplyports 43M may be disposed at each of the +Y side and the −Y side withrespect to the optical path K. The third liquid supply ports 43M may bedisposed at each of the +X side, the −X side, the +Y side, and the −Yside with respect to the optical path K. A plurality of the third liquidsupply ports 43M may be provided to surround the optical path K.

The third liquid supply part 43 (third liquid supply port 43M) isconnected to the liquid supply apparatus via a supply channel 43R whichis formed inside the first member 21. The liquid LQ discharged from theliquid supply apparatus is sent to the third liquid supply part 43 viathe supply channel 43R. The third liquid supply part 43 supplies theliquid LQ supplied from the liquid supply apparatus via the supplychannel 43R to the optical path space SPK.

Moreover, the third liquid supply part 43 (third liquid supply part 43M)may be disposed at the first member 21 to face the third space SP3. Thatis, the third liquid supply port 43M may be disposed at the innersurface 25 of the first member 21 to be opposite to the outer surface131. The third liquid supply part 43 may supply the liquid LQ to the gap(third space SP3) between the first member 21 and the terminal opticalelement 13. When the first part 211 is a portion of the first member 21which is disposed at the surrounding of the optical path K and theoptical path KL (terminal optical element 13), the third liquid supplypart 43 may be disposed at the first part 211 to be opposite to theouter surface 131 of the terminal optical element 13.

The first liquid recovery part 51 is disposed at the second member 22.The first liquid recovery part 51 is disposed at at least a portion ofthe surrounding of the second opening part 30. The first liquid recoverypart 51 is disposed to be opposite to the upper surface of the substrateP (object). The first liquid recovery part 51 is disposed to face thesecond space SP2. The first liquid recovery part 51 is disposed at thelower surface 31.

In the present embodiment, the first liquid recovery part 51 is disposedat the lower surface 31, and includes an opening (first liquid recoverport) 51M which is able to recover the liquid LQ. As shown in FIG. 4, aplurality of the first liquid recovery ports 51M are disposed at thelower surface 31. The plurality of first liquid recovery ports 51M aredisposed to surround the optical path K. The plurality of first liquidrecovery ports 51M are disposed with intervals in the surrounding of theoptical path K. In the present embodiment, the plurality of first liquidrecovery ports 51M are disposed along a rectangular virtual line in theXY plane.

The first liquid recovery part 51 (first liquid recover port 51M) isconnected to a liquid recovery apparatus via a recovery channel 51Rwhich is formed inside of the second member 22. The liquid recoveryapparatus is able to be connected to the first liquid recovery part 51and a vacuum system (suction apparatus). The liquid recovery apparatusmay include a tank which accommodates the recovered liquid LQ. The firstliquid recovery part 51 is able to recover at least a portion of theliquid LQ of the second space SP2. The liquid LQ recovered from thefirst liquid recovery part 51 is recovered to the liquid recoveryapparatus via the recovery channel 51R.

In the present embodiment, the first liquid recovery part 51 (firstliquid recovery port 51M) recovers (suctions) both of the liquid LQ andthe gas G of the second space SP1. The first liquid recovery part 51 isable to recover the liquid LQ and the gas G together. In other words,the first liquid recovery part 51 performs a gas-liquid mixturerecovery.

The second liquid recovery part 52 is disposed at the first member 21.The second liquid recovery part 52 is able to recover at least a portionof the liquid LQ which is flowed from the substrate P (object) into thegap (fourth space SP4) between the first member 21 and the second member22. The second liquid recovery part 52 is able to recover at least aportion of the liquid LQ which is flowed to the fourth space SP4 betweenthe first member 21 and the second member 22 via the opening part 301.The second liquid recovery part 52 is disposed to face the fourth spaceSP4. The second liquid recovery part 52 is disposed above the openingpart 301 inside the fourth space SP4. In the present embodiment, thesecond liquid recovery part 52 is disposed at the second part 212 of thefirst member 21. In the present embodiment, the second liquid recoverypart 52 is disposed at the upper plate part 214 (second part 212) toface the space SP4b between the upper plate part 214 (second part 212)and the second member 22. In the present embodiment, the second liquidrecovery part 52 is disposed at the lower surface 28. The second liquidrecovery part 52 recovers the liquid LQ from the first gap part havingthe size Ha in the space SP4b.

The second liquid recovery part 52 (second liquid recovery port 52M) isconnected to the liquid recovery apparatus via the recovery channel 52Rwhich is formed inside the first member 21. The second liquid recoverypart 52 is able to recover at least a portion of the liquid LQ of thefourth space SP4. The liquid LQ recovered from the second liquidrecovery part 52 is recovered to the liquid recovery apparatus via therecovery channel 52R.

In the present embodiment, the second liquid recovery part 52 includes aporous member 57. The porous member 57 includes a mesh plate. The porousmember 57 includes a lower surface which is able to be opposite to theupper surface 33, an upper surface which faces the recovery channel 52R,and a plurality of holes which connect the lower surface and the uppersurface. The lower surface 28 is disposed at the surrounding of thelower surface of the porous member 57. The second liquid recovery part52 recovers the liquid LQ via the holes of the porous member 57. In thepresent embodiment, the holes of the porous member 57 function as theopenings (second liquid recover port) 52M which are able to recover theliquid LQ. The liquid LQ in the fourth space SP4 recovered from thesecond liquid recovery part 52 (second liquid recovery port 52M) flowsinto the recovery channel 52R, flows through the recovery channel 52R,and is recovered by the liquid recovery apparatus.

In the present embodiment, only the liquid LQ is substantially recoveredvia the second liquid recovery part 52, and the recovery of the gas G islimited. The controller 6 adjusts a difference between a pressure(pressure in fourth space SP4) at the lower surface side of the porousmember 57 and a pressure (pressure in recovery channel 52R) at the uppersurface side so that the liquid LQ in the fourth space SP4 passesthrough the holes of the porous member 57 and flows into the recoverychannel 52R, and the gas G does not pass through the holes. Moreover,for example, an example of the technology, which only recovers theliquid via the porous member, is disclosed in U.S. Pat. No. 7,292,313and the like.

In addition, the second liquid recovery part 52 may recover (suction)both of the liquid LQ and the gas G via the porous member 57. Inaddition, the second liquid recovery part 52 may not include the porousmember 57. That is, a fluid (one or both of the liquid LQ and the gas G)in the fourth space SP4 may be recovered without going through theporous member.

The third liquid recovery part 53 is disposed at the first member 21.The third liquid recovery part 53 recovers the liquid LQ from the gap(third space SP3) between the terminal optical element 13 and the firstmember 21. The third liquid recovery part 53 is able to recover at leasta portion of the liquid LQ which flows in the third space SP3 betweenthe terminal optical element 13 and the first member 21. The thirdliquid recovery part 53 is disposed to face the third space SP3. Thethird liquid recovery part 53 is disposed above the first opening part23. The third liquid recovery part 53 is disposed above the third liquidsupply part 43. The third liquid recovery part 53 is disposed above theemitting surface 12. The third liquid recovery part 53 is disposed to beopposite to the outer surface 131 of the terminal optical element 13.The third liquid recovery part 53 is disposed at the first part 211. Thefirst part 211 may be a portion of the first member 21 which is disposedat the surrounding of the optical path K, and may include a portion ofthe first member 21 which is disposed at the surrounding of the opticalpath KL (terminal optical element 13). In the present embodiment, thethird liquid recovery part 53 is disposed at the inner surface 25.

The third liquid recovery part 53 (third liquid recovery port 53M) isconnected to the liquid recovery apparatus via a recovery channel 53Rwhich is formed inside the first member 21. The third liquid recoverypart 53 is able to recover at least a portion of the liquid LQ of thethird space SP3. The liquid LQ recovered from the third liquid recoverypart 53 is recovered to the liquid recovery apparatus via the recoverychannel 53R.

In the present embodiment, the third liquid recovery part 53 includes aporous member 58. The porous member 58 includes a mesh plate. The porousmember 58 includes one surface which is able to be opposite to the outersurface 131, the other surface which faces the recovery channel 53R, anda plurality of holes which connect the one surface and the othersurface. In the present embodiment, the inner surface 25 is disposed atthe surrounding of the one surface of the porous member 58. The thirdliquid recovery part 53 recovers the liquid LQ via the holes of theporous member 58. In the present embodiment, the holes of the porousmember 58 function as openings (third liquid recovery port) 53M whichare able to recover the liquid LQ. The liquid LQ in the third space SP3recovered from the third liquid recovery part 53 (third liquid recoveryport 53M) flows into the recovery channel 53R, flows through therecovery channel 53R, and is recovered by the liquid recovery apparatus.

In the present embodiment, only the liquid LQ is substantially recoveredvia the third liquid recovery part 53, and the recovery of the gas G islimited. The controller 6 adjusts a difference between a pressure(pressure in third space SP3) at the one surface side of the porousmember 58 and a pressure (pressure in recovery channel 53R) at the othersurface side so that the liquid LQ in the third space SP3 passes throughthe holes of the porous member 58 and flows into the recovery channel53R, and the gas G does not pass through the holes. Moreover, forexample, an example of the technology, which only recovers the liquidvia the porous member, is disclosed in U.S. Pat. No. 7,292,313 or like.

Moreover, the third liquid recovery part 53 may recover (suction) bothof the liquid LQ and the gas G via the porous member 58. Moreover, thethird liquid recovery part 53 may not include the porous member 58. Thatis, a fluid (one or both of the liquid LQ and the gas G) in the thirdspace SP3 may be recovered without going through the porous member.

The first gas supply part 61 is disposed at the second member 22. Thefirst gas supply part 61 is disposed at at least a portion of thesurrounding of the second opening part 30. The first gas supply part 61is disposed to be opposite to the upper surface of the substrate P(object). The first gas supply part 61 is disposed to face the secondspace SP2. The first gas supply part 61 is disposed at the lower surface31.

In the present embodiment, the first gas supply part 61 includes anopening (first gas supply port) 61M which is disposed at the lowersurface 31 and is able to supply the gas G. As shown in FIG. 4, aplurality of the first gas supply ports 61M are disposed at the lowersurface 31. The plurality of first gas supply ports 61M are disposed tosurround the optical path K. The plurality of first gas supply ports 61Mare disposed with intervals at the surrounding of the optical path K. Inthe present embodiment, the plurality of first gas supply ports 61M aredisposed along a rectangular virtual line in the XY plane.

The first liquid supply part 61 (first liquid supply port 61M) isconnected to a gas supply apparatus via a supply channel 61R which isformed inside the second member 22. The gas supply apparatus includes afilter apparatus which cleans the gas G to be supplied, a temperatureadjustment apparatus which is able to adjust the temperature of the gasG to be supplied, or the like, and the liquid supply apparatus is ableto supply the cleaned gas G in which the temperature is adjusted.Moreover, in the present embodiment, the gas supply apparatus includes ahumidity adjustment apparatus which is able to adjust humidity of thegas G to be supplied, and thus, is able to supply the humidified gas G,for example. The humidity adjustment apparatus is able to increase thehumidity of the gas G by using the liquid LQ (liquid LQ for exposure)forming the liquid immersion space LS. The gas G discharged from the gassupply apparatus is sent to the first gas supply part 61 via the supplychannel 61R. The first gas supply part 61 supplies the gas G, which issupplied from the gas supply apparatus via the supply channel 61R, tothe second space SP2.

In the present embodiment, the first gas supply part 61 is disposedoutside the first liquid recovery part 51 in the radial direction withrespect to the optical path K (optical axis AX).

The second liquid supply part 42 is disposed between the optical path Kand the first liquid recovery part 51 in the radial direction withrespect to the optical path K (optical axis AX). The second liquidsupply part 42 is disposed between a center of the second opening part30 and the first liquid recovery part 51 in the radial direction withrespect to the center of the second opening part 30.

The first liquid supply part 41 is disposed between the optical path Kand the second liquid supply part 42 in the radial direction withrespect to the optical path K (optical axis AX). The first liquid supplypart 41 is disposed between a center of the first opening part 23 andthe opening part 301 in the radial direction with respect to the centerof the first opening part 23.

The third liquid supply part 43 is disposed to be closer to the opticalpath K side than the second liquid supply part 42. The third liquidsupply part 43 is disposed above the first and second liquid supplyparts 41 and 42. The third liquid supply part 43 is disposed below thethird liquid recovery part 53. The third liquid supply part 43 isdisposed to be closer to the optical path K side than the third liquidrecovery part 53.

The second liquid recovery part 52 is disposed above the first andsecond liquid supply parts 41 and 42. The second liquid recovery part 52is disposed above the opening part 301. The second liquid recovery part52 is disposed outside the opening part 301 in the radial direction withrespect to the optical path K (optical axis AX).

The third space SP3 communicates with the space CS outside the liquidimmersion member 5 via the opening part 35 different from the firstopening part 23. The opening part 35 is disposed at the upper end of thegap between the terminal optical element 13 and the first member 21. Thethird space SP3 is opened to the space CS (atmosphere at the surroundingof the liquid immersion member 5) via the opening part 35. When thespace CS is the atmospheric pressure, the third space SP3 is opened tothe atmosphere via the opening part 35. In addition, the pressure of thespace CS may be higher or lower than the atmosphere pressure.

The opening part 35 is disposed at a higher position than the firstopening part 23. The opening part 35 is disposed between the outersurface 131 and the upper surface 27 (inner edge of upper surface 27).The opening part 35 cannot contact the liquid LQ on the substrate P(object).

The fourth space SP4 communicates with the space CS outside the liquidimmersion member 5 via the opening part 302 different from the openingpart 301. The opening part 302 is disposed at the other end of the gap(fourth space SP4) between the first member 21 and the second member 22.The fourth space SP4 is opened to the space CS (atmosphere at thesurrounding of the liquid immersion member 5) via the opening part 302.When the space CS is the atmospheric pressure, the fourth space SP4 isopened to the atmosphere via the opening part 302. In addition, thepressure of the space CS may be higher or lower than the atmospherepressure.

The other end (opening part 302) of the gap between the first member 21and the second member 22 is positioned at a higher position than the oneend (opening part 301) of the gap between the first member 21 and thesecond member 22. The opening part 302 is disposed between the lowersurface 28 (the outer edge of the lower surface 28) and the uppersurface 33 (the outer edge of the upper surface 33). In other words, theopening part 302 is disposed between the outer surface 29 and the outersurface 34. The opening part 302 is disposed not to be opposite to thesurface of the substrate P (object). The opening part 302 cannot contactthe liquid LQ on the substrate P (object).

The second space SP2 communicates with the space CS outside the liquidimmersion member 5 via the opening part 36. The opening part 36 isdisposed at the other end of the gap between the second member 22 andthe substrate P (object). The opening part 36 is disposed between thelower surface 31 (the outer edge of the lower surface 31) and the uppersurface of the substrate P (object). The second space SP2 is opened tothe space CS (atmosphere at the surrounding of the liquid immersionmember 5) via the opening part 36. When the space CS is the atmosphericpressure, the second space SP2 is opened to the atmosphere via theopening part 36. In addition, the pressure of the space CS may be higheror lower than the atmosphere pressure.

The second space SP2 and the fourth space SP4 are connected to eachother via the opening part 301. The first space SP1 and the fourth spaceSP4 are connected to each other via the opening part 301. The firstspace SP1 and the optical path space SPK are connected to each other viathe first opening part 23. The optical path space SPK and the thirdspace SP3 are connected to each other via the opening part 37 betweenthe emitting surface 12 and the inner surface 25.

That is, the fluid (one or both of the liquid LQ and the gas G) is ableto circulate (move) between the optical path space SPK and the thirdspace SP3, is able to circulate (move) between the optical path spaceSPK and the first space SP1, is able to circulate (move) between thefirst space SP1 and the third space SP3, is able to circulate (move)between the second space SP1 and the third space SP3, and is able tocirculate (move) between the first space SP1 and the second space SP2.

In addition, the pressure of the fourth space SP4 to which the secondliquid recovery part 52 (porous member 57) faces is able to be adjustedby the chamber apparatus 9. The pressure of the recovery channel 57R isable to be adjusted by the liquid recovery apparatus which is connectedto the recovery channel 57R.

Moreover, the pressure of the third space SP3 to which the third liquidrecovery part 53 (porous member 58) faces is able to be adjusted by thechamber apparatus 9. The pressure of the recovery channel 58R is able tobe adjusted by the liquid recovery apparatus which is connected to therecovery channel 58R.

In the present embodiment, a recovery operation of the liquid LQ fromthe first liquid recovery part 51 is performed in parallel with at leastone of the liquid LQ supply operation from the first liquid supply part41, the second liquid supply part 42, and the third liquid supply part43, and thus, the liquid immersion space LS is formed by the liquid LQbetween the terminal optical element 13 and the liquid immersion member5 on a one side, and between the terminal optical element 13 and thesubstrate P (object) on the another side.

When the supply operation of the liquid LQ in the first liquid supplypart 41 is performed, the first liquid recovery, part 51 is able torecover at least a portion of the liquid LQ from the first liquidrecovery part 41. When the supply operation of the liquid LQ in thesecond liquid supply part 42 is performed, the first liquid recoverypart 51 is able to recover at least a portion of the liquid LQ from thesecond liquid recovery part 42. When the supply operation of the liquidLQ in the third liquid supply part 43 is performed, the first liquidrecovery part 51 is able to recover at least a portion of the liquid LQfrom the third liquid recovery part 43.

By performing the recovery operation of the liquid LQ from the firstliquid recovery part 51, the interface LG (first interface LG1) of theliquid LQ in the liquid immersion space LS is maintained more insidethan the first liquid recovery part 51 in the radial direction withrespect to the optical axis AX (optical path K). The first interface LG1is at least maintained more inside than the end part outside the firstliquid recovery part 51 (first liquid recovery port 51M).

For example, the recovery operation of the liquid LQ from the firstliquid recovery part 51 is performed in parallel with the supplyoperation of the liquid LQ from the second liquid supply part 42, andthus, the interface LG (first interface LG1) of the liquid LQ in theliquid immersion space LS is maintained between the second liquid supplypart 42 and the first liquid recovery part 51 in the radial directionwith respect to the optical axis AX (optical path K). The firstinterface LG1 is maintained at least between the second liquid supplypart 42 and the end part outside the first liquid recovery part 51(first liquid recovery port 51M). The recovery operation of the liquidLQ from the first liquid recovery part 51 is performed in parallel withthe supply operation of the liquid LQ from the second liquid supply part42, and thus, even when the second member 22 moves in the XY plane inthe state where the liquid immersion space LS is formed, the firstinterface LG1 is maintained between the second liquid supply part 42 andthe first liquid recovery part 51.

Moreover, in the present embodiment, a recovery operation of the liquidLQ from the second liquid recovery part 52 is performed in parallel withat least one of the supply operation of the liquid LQ from the firstliquid supply part 41, the second liquid supply part 42, and the thirdliquid supply part 43, and the recovery operation of the liquid LQ fromthe first liquid recovery part 51. Accordingly, the liquid LQ flowinginto the fourth space SP4 via the opening part 301 is suppressed fromflowing out from the fourth space SP4.

In addition, in the present embodiment, a recovery operation of theliquid LQ from the third liquid recovery part 53 is performed inparallel with at least one of the supply operation of the liquid LQ fromthe first liquid supply part 41, the second liquid supply part 42, andthe third liquid supply part 43, and the recovery operation of theliquid LQ from the first liquid recovery part 51. Accordingly, theliquid LQ flowing into the third space SP3 is suppressed from flowingout from the third space SP3.

In addition, in the present embodiment, a supply operation of the gas Gfrom the first gas supply part 61 is performed in parallel with at leastone of the supply operation of the liquid LQ from the first liquidsupply part 41, the second liquid supply part 42, and the third liquidsupply part 43, and the recovery operation of the liquid LQ from thefirst liquid recovery part 51. The first gas supply part 61 is able tosupply the gas G at the outside of the liquid immersion space LS. By thegas G supplied from the first gas supply part 61, a gas seal is formedoutside the liquid immersion space LS. Accordingly, the liquid LQ in thesecond space SP2 is suppressed from flowing out from the second spaceSP2.

In the present embodiment, the humidified gas G may be supplied from thefirst gas supply part 61. The humidity of the gas G supplied from thefirst gas supply part 61 is higher than the humidity of the gas Gssupplied from the air conditioner 9S of the chamber apparatus 9.Occurrence of vaporization heat is suppressed by the supply of thehumidified gas G. Accordingly, occurrence of a temperature change of thesubstrate P (object), a temperature change of the liquid immersionmember 5, a temperature change of the liquid LQ in the liquid immersionspace LS, a temperature change in the space (environment) in which theliquid immersion member 5 is disposed, or the like, which occurs due tothe vaporization heat, is suppressed.

Next, an example of an operation of the second member 22 will bedescribed.

The second member 22 is movable with respect to the first member 21. Thesecond member 22 is movable with respect to the terminal optical element13. A relative position between the second member 22 and the firstmember 21 is changed. The relative position between the second member 22and the terminal optical element 13 is changed.

The second member 22 is able to relatively move in the XY planeperpendicular to the optical axis AX of the terminal optical element 13.The second member 22 is able to move to be substantially parallel to theXY plane. In the present embodiment, the second member 22 is able tomove in at least the X axis direction.

Moreover, the second member 22 may be able to move in six directions ofthe X axis, the Y axis, the Z axis, the θX, the θY, and the θZdirections, and may be able to move in at least one direction of the sixdirections. Moreover, the second member 22 may be able to move in atleast one direction of the Y axis, the Z axis, the θX, the θY, and theθZ directions, in addition to the X axis direction.

For example, the second member 22 moves in the XY plane, and thus, thesize of the gap between the outer surface 26 of the first member 21 andthe inner surface 32 of the second member 22 is changed. In other words,the second member 22 moves in the XY plane, and thus, the size of thespace between the outer surface 26 and the inner surface 32 is changed.For example, the second member 22 moves in the −X axis direction, andthus, the size of the gap between the outer surface 26 and the innersurface 32 in the +X side with respect to the terminal optical element13 is decreased (the space between the outer surface 26 and the innersurface 32 is decreased). The second member 22 moves in the +X axisdirection, and thus, the size of the gap between the outer surface 26and the inner surface 32 in the +X side with respect to the terminaloptical element 13 is increased (the space between the outer surface 26and the inner surface 32 is increased).

In the present embodiment, a movable range of the second member 22 isdetermined so that the first member 21 (outer surface 26) and the secondmember 22 (inner surface 32) do not contact each other.

The second member 22 is movable in cooperation with the movement of thesubstrate P (object). The second member 22 is movable to be independentof the substrate P (object). The second member 22 is movable in parallelwith at least a portion of the movement of the substrate P (object).

The second member 22 may move in parallel with at least a part of aperiod in which the substrate P (object) moves. The second member 22 maymove in a movement direction of the substrate P (object). For example,in at least a part of the period in which the substrate P moved, thesecond member 22 may move in the movement direction of the substrate P.For example, when the substrate P is moved in one direction (forexample, +X axis direction) in the XY plane, the second member 22 maymove in one direction (the +X axis direction) in the XY plane insynchronization with the movement of the substrate P.

The second member 22 may move in a state where the liquid immersionspace LS is formed. The second member 22 may move in a state where theliquid LQ of the liquid immersion space LS contacts the second member22. The second member 22 may move in a state where the liquid LQ existsin one or both of the second space SP2 and the fourth space SP4.

The second member 22 may move in parallel with the supply operation ofthe liquid LQ from at least one of the first liquid supply part 41, thesecond liquid supply part 42, and the third liquid supply part 43.

The second member 22 may move in parallel with the recovery operation ofthe liquid LQ from at least one of the first liquid recovery part 51,the second liquid recovery part 52, and the third liquid recovery part53.

The second member 22 may move in parallel with the supply operation ofthe gas G from the first gas supply part 61.

The second member 22 may move in at least a part of a period in whichthe exposure light EL is emitted from the emitting surface 12.

The second member 22 may move in parallel with at least a part of aperiod in which the substrate P (object) moves in the state where theliquid immersion space LS is formed.

The second member 22 may move in at least a part of a period in whichthe exposure light EL is emitted from the emitting surface 12 in thestate where the liquid immersion space LS is formed.

The second member 22 may move when the second member 22 and thesubstrate P (object) are not opposite to each other. The second member22 may move when the object does not exist below the second member 22.

The second member 22 may move when the liquid LQ does not exist in thespace between the second member 22 and the substrate P (object). Thesecond member 22 may move when the liquid immersion space LS is notformed.

In the present embodiment, for example, the second member 22 moves basedon movement conditions of the substrate P (object). For example, thecontroller 6 moves the second member 22 in parallel with at least aportion of the movement of the substrate P (object) based on themovement conditions of the substrate P (object). The controller 6 movesthe second member 22 while performing the supply of the liquid LQ fromat least one of the first, the second, and the third liquid supply parts41, 42, and 43 and the recovery of the liquid LQ from the first liquidrecovery part 51 so that the liquid immersion space LS is continuouslyformed.

In the present embodiment, the second member 22 is movable so that arelative movement between the second member 22 and the substrate P(object) is decreased. The second member 22 is movable so that therelative movement between the second member 22 and the substrate P(object) is smaller than the relative movement between the terminaloptical element 13 and the substrate P (object). The second member 22 ismovable so that the relative movement between the second member 22 andthe substrate P (object) is smaller than the relative movement betweenthe first member 21 and the substrate P (object). For example, thesecond member 22 may move in synchronization with the substrate P(object). For example, the second member 22 may move to follow thesubstrate P (object).

The relative movement includes at least one of a relative speed and arelative acceleration. For example, in the state where the liquidimmersion space LS is formed, that is, in a state where the liquid LQexists in the second space SP2, the second member 22 may move so thatthe relative speed between the second member 22 and the substrate P(object) is decreased.

Moreover, in the state where the liquid immersion space LS is formed,that is, in the state where the liquid LQ exists in the second spaceSP2, the second member 22 may move so that the relative accelerationbetween the second member 22 and the substrate P (object) is decreased.

In addition, in the state where the liquid immersion space LS is formed,that is, in the state where the liquid LQ exists in the second spaceSP2, the second member 22 may move so that the relative speed betweenthe second member 22 and the substrate P (object) is smaller than therelative speed between the first member 21 and the substrate P (object).

Moreover, in the state where the liquid immersion space LS is formed,that is, in the state where the liquid LQ exists in the second spaceSP2, the second member 22 may move so that the relative accelerationbetween the second member 22 and the substrate P (object) is smallerthan the relative acceleration between the first member 21 and thesubstrate P (object).

For example, the second member 22 is movable in the movement directionof the substrate P (object). For example, when the substrate P (object)moves in the +X axis direction (or the −X axis direction), the secondmember 22 is movable in the +X axis direction (or the −X axisdirection). Moreover, when the substrate P (object) moves in the +Y axisdirection (or the −Y axis direction) while moving in the +X axisdirection, the second member 22 is movable in the +X axis direction. Inaddition, when the substrate P (object) moves in the +Y axis direction(or the −Y axis direction) while moving in the −X axis direction, thesecond member 22 is movable in the −X axis direction.

That is, in the present embodiment, when the substrate P (object) movesin the direction which includes the component of the X axis direction,the second member 22 moves in the X axis direction. For example, thesecond member 22 may move in the X axis direction in parallel with atleast a portion of the movement of the substrate P (object) in thedirection including the component in the X axis direction.

Moreover, the second member 22 is movable in the Y axis direction. Whenthe substrate P (object) moves in the direction including the componentin the Y axis direction, the second member 22 may move in the Y axisdirection. For example, the second member 22 may move in the Y axisdirection so that the relative speed between the second member 22 andthe substrate P (object) is decreased in parallel with at least aportion of the movement of the substrate P (object) in the directionincluding the component in the Y axis direction.

Next, a method of exposing the substrate P using the above-describedexposure apparatus EX will be described.

In the descriptions below, in order to form the liquid immersion spaceLS, the liquid LQ is supplied from each of the first liquid supply part41, the second liquid supply part 42, and the third liquid supply part43, and the liquid LQ is recovered from each of the first liquidrecovery part 51, the second liquid recovery part 52, and the thirdliquid recovery part 53.

Moreover, in the descriptions below, the first, the second, the thirdliquid supply parts 41, 42, and 43 are collectively referred to as aliquid supply part 40 appropriately. The first, the second, the thirdliquid recovery parts 51, 52, and 53 are collectively referred to as aliquid recovery part 50 appropriately.

In addition, for example, in order to form the liquid immersion spaceLS, the liquid LQ may be supplied from the third liquid supply part 43,and the liquid LQ may not be supplied from the first and second liquidsupply parts 41 and 42. The liquid LQ may be supplied from the secondand third liquid supply parts 42 and 43, and the liquid LQ may not beprovided from the first liquid supply part 41. The liquid LQ may besupplied from the second liquid supply part 42, and the liquid LQ maynot be provided from the first and third liquid supply parts 41 and 43.The liquid LQ may be supplied from the first and second liquid supplyparts 41 and 42, and the liquid LQ may not be provided from the thirdliquid supply part 43. The liquid LQ may be supplied from the firstliquid supply part 41, and the liquid LQ may not be provided from thesecond and third liquid supply parts 42 and 43.

In addition, for example, the liquid LQ may be recovered from the firstliquid recovery part 51, and the liquid LQ may not be recovered from thesecond and third liquid recovery parts 51 and 52. The liquid LQ may berecovered from the first and second liquid recovery parts 51 and 52, andthe liquid LQ may not be recovered from the third liquid recovery part53. The liquid LQ may be recovered from the first and third liquidrecovery parts 51 and 53, and the liquid LQ may not be recovered fromthe second liquid recovery part 52.

In a substrate exchange position away from the liquid immersion member5, processing which carries (loads) the substrate P before the exposureto the substrate stage 2 (first holding part) is performed. In at leasta part of a period in which the substrate stage 2 is away from theliquid immersion member 5, the measurement stage 3 is disposed to beopposite to the terminal optical element 13 and the liquid immersionmember 5. The controller 6 performs the supply of the liquid LQ from theliquid supply part 40 and the recovery of the liquid LQ from the liquidrecovery part 50, and thus, forms the liquid immersion space LS on themeasurement stage 3.

After the substrate P before the exposure is loaded on the substratestage 2 and the measurement processing using the measurement stage 3 isterminated, the controller 6 moves the substrate stage 2 so that theterminal optical element 13 and the liquid immersion member 5 areopposite to the substrate stage 2 (substrate P). In the state where theterminal optical element 13 and the liquid immersion member 5 areopposite to the substrate stage 2 (substrate P), the recovery of theliquid LQ from the liquid recovery part 50 is performed in parallel withthe supply of the liquid LQ from the liquid supply part 40, and thus,the liquid immersion space LS is formed between the terminal opticalelement 13 and the liquid immersion member 5, and the substrate stage 2(substrate P) so that the optical path K is filled with the liquid LQ.

The controller 6 starts the exposure processing of the substrate P. Inthe state where the liquid immersion space LS is formed on the substrateP, the controller 6 emits the exposure light EL from the illuminationsystem IL. The illumination system IL illuminates the mask M with theexposure light EL. The exposure light EL from the mask M is radiated tothe substrate P via the liquid LQ in the liquid immersion space LSbetween the projection optical system PL and the emitting surface 12,and the substrate P. Accordingly, the substrate P is exposed by theexposure light EL which is emitted from the emitting surface 12 via theliquid LQ in the liquid immersion space LS between the emitting surface12 of the terminal optical element 13 and the substrate P, and the imageof the pattern of the mask M is projected to the substrate P.

The exposure apparatus EX of the present embodiment is a scanning typeexposure apparatus (a so-called scanning stepper) in which the mask Mand the substrate P synchronously move in a predetermined scanningdirection and the image of the pattern of the mask M is projected to thesubstrate P. In the present embodiment, the scanning direction of thesubstrate P (synchronous movement direction) is set to the Y axisdirection, and the scanning direction (synchronous movement direction)of the mask M is also set to the Y axis direction. The controller 6radiates the exposure light EL to the substrate P via the projectionoptical system PL and the liquid LQ in the liquid immersion space LS onthe substrate P while moving the substrate P in the Y axis directionwith respect to the projection region PR of the projection opticalsystem PL and moving the mask M in the Y axis direction with respect tothe illumination region IR of the illumination system IL insynchronization with the movement in the Y axis direction of thesubstrate P.

FIG. 6 is a view showing an example of the substrate P which is held bythe substrate stage 2. In the present embodiment, a plurality of shotregions S, which are regions to be exposed on the substrate P, arearranged in a matrix form. The controller 6 sequentially exposes theplurality of shot regions S of the substrate P by the exposure light ELemitted from the emitting surface 12 via the liquid LQ in the liquidimmersion space LS between the emitting surface 12 and the substrate Pwhile moving the substrate P held in the first holding part in the Yaxis direction (scanning direction) with respect to the exposure lightEL emitted from the emitting surface 12 of the terminal optical element13.

For example, in order to expose one shot region S of the substrate P, inthe state where the liquid immersion space LS is formed, the controller6 radiates the exposure light EL to the shot region S via the projectionoptical system PL and the liquid LQ in the liquid immersion space LS onthe substrate P while moving the substrate P in the Y axis directionwith respect to the exposure light EL emitted from the emitting surface12 (the projection region PR of the projection optical system PL), andmoving the mask M in the Y axis direction with respect to theillumination region IR of the illumination system IL in synchronizationwith the movement in the Y axis direction of the substrate P.Accordingly, the image of the pattern of the mask M is projected to theshot region S, and the shot region S is exposed by the exposure light ELwhich is emitted from the emitting surface 12.

After the exposure of the shot region S is terminated, in order to startthe exposure of a next shot region S, in the state where the liquidimmersion space LS is formed, the controller 6 moves the substrate P inthe direction (for example, X axis direction, directions which areinclined with respect to the X axis direction and Y axis direction inthe XY plane, or the like) which intersects the Y axis in the XY plane,and moves the next shot region S to an exposure starting position.Thereafter, the controller 6 starts the exposure of the shot region S.

The controller 6 repeats the operation which exposes the shot regionwhile moving the shot region in the Y axis direction with respect to theposition (projection region PR) radiated with the exposure light EL fromthe emitting surface 12 in the state where the liquid immersion space LSis formed above the substrate P (substrate stage 2), and after theexposure of the shot region, the operation which moves the substrate Pin the direction (for example, X axis direction, directions which areinclined with respect to the X axis direction and Y axis direction inthe XY plane, or the like) which intersects the Y axis direction in theXY plane so that the next shot region is disposed at the exposurestarting position in the state where the liquid immersion space LS isformed on the substrate P (substrate stage 2), and the controllersequentially exposes the plurality of shot regions of the substrate P.

In the descriptions below, the operation, which moves the substrate P(shot region) in the Y axis direction with respect to the position(projection region PR) radiated with the exposure light EL from theemitting surface 12 in the state where the liquid immersion space LS isformed above the substrate P (substrate stage 2) in order to expose theshot region, is appropriately referred to as a scan movement operation.Moreover, the operation, which moves the substrate P in the XY planebefore the exposure of the next shot region starts in the state wherethe liquid immersion space LS is formed on the substrate P (substratestage 2) after the exposure of a predetermined shot region isterminated, is appropriately referred to as a step movement operation.

In the present embodiment, the scan movement operation includes anoperation in which the substrate P moves in the Y axis direction from astate where a predetermined shot region S is disposed at the exposurestarting position to a state where the predetermined shot region isdisposed at the exposure termination position. The step movementoperation includes an operation in which the substrate P moves in adirection intersecting the Y axis direction in the XY plane from a statewhere a predetermined shot region S is disposed at the exposuretermination position to a state where the next shot region S is disposedat the exposure starting position.

The exposure starting position includes a position of the substrate Pwhen one end in the Y axis direction of a predetermined shot region Spasses through the projection region PR in order to expose the shotregion S. The exposure termination position includes a position of thesubstrate P when the other end in the Y axis direction of the shotregion S radiated by the exposure light EL passes through the projectionregion PR.

The exposure starting position of the shot region S includes a startingposition of the scan movement operation in order to expose the shotregion S. The exposure starting position of the shot region S includes atermination position of the step movement operation in order to disposethe shot region S at the exposure starting position.

The exposure termination position of the shot region S includes atermination position of the scan movement operation in order to exposethe shot region S. The exposure termination position of the shot regionS includes a starting position of the step movement operation in orderto dispose the next shot region S at the exposure starting positionafter the exposure of the shot region S is terminated.

In the descriptions below, a period, in which the scan movementoperation is performed in order to expose a predetermined shot region S,is appropriately referred to as a scan movement period. In thedescriptions below, a period, in which the step movement operation isperformed in order to start the exposure of the next shot region S afterthe exposure termination of a predetermined shot region S, isappropriately referred to as a step movement period.

The scan movement period includes the exposure period from the exposurestart of a predetermined shot region S to the exposure termination. Thestep movement period includes a movement period of the substrate P fromthe exposure termination of a predetermined shot region S to theexposure start of the next shot region S.

In the scan movement operation, the exposure light EL is emitted fromthe emitting surface 12. In the scan movement operation, the exposurelight EL is radiated to the substrate P (object). In the step movementoperation, the exposure light EL is not emitted from the emittingsurface 12. In the step movement operation, the exposure light EL is notradiated to the substrate P (object).

The controller 6 sequentially exposes the plurality of shot regions S ofthe substrate P while repeating the scan movement operation and the stepmovement operation. Moreover, the scan movement operation is an equalspeed movement mainly in the Y axis direction. The step movementoperation includes acceleration and deceleration movements. For example,the step movement operation from the exposure termination of apredetermined shot region S to the exposure start of the next shotregion S includes one or both of the acceleration and decelerationmovements in the Y axis direction and the acceleration and decelerationmovements in the X axis direction.

Moreover, there is a case where at least a portion of the liquidimmersion space LS may be formed above the substrate stage 2 (covermember T) in at least a portion of the scan movement operation and thestep movement operation. There is a case where the liquid immersionspace LS may be formed over the substrate P and the substrate stage 2(cover member T) in at least a portion of the scan movement operationand the step movement operation. When the exposure of the substrate P isperformed in a state where the substrate stage 2 and the measurementstage 3 approach or contact each other, there is a case where the liquidimmersion space LS may be formed over the substrate stage 2 (covermember T) and the measurement stage 3 in at least a portion of the scanmovement operation and the step movement operation.

The controller 6 controls the driving system 15 based on exposureconditions of the plurality of shot regions S on the substrate P andmoves the substrate P (substrate stage 2). For example, the exposureconditions of the plurality of shot regions S are defined by exposurecontrol information referred to as an exposure recipe. The exposurecontrol information is stored in the storage apparatus 7.

The exposure conditions (exposure control information) includearrangement information of the plurality of shot regions S (the positionof each of the plurality of shot regions S in the substrate P).Moreover, the exposure conditions (exposure control information) includesize information (size information with respect to the Y axis direction)of each of the plurality of shot regions S.

The controller 6 sequentially exposes the plurality of shot regions Swhile moving the substrate P by a predetermined movement condition basedon the exposure conditions (exposure control information) stored in thestorage apparatus 7. The movement conditions of the substrate P (object)include at least one of the movement speed, the acceleration, themovement distance, the movement direction, and the movement locus in theXY plane.

As an example, when the plurality of shot regions S are sequentiallyexposed, the controller 6 radiates the exposure light EL to theprojection region PR while moving the substrate stage 2 so that theprojection region PR of the projection optical system PL and thesubstrate P are relatively moved along the movement locus shown by anarrow Sr in FIG. 6, and sequentially exposes the plurality of shotregions S via the liquid LQ by the exposure light EL. The controller 6sequentially exposes the plurality of shot regions S while repeating thescan movement operation and the step movement operation.

In the present embodiment, the second member 22 moves in at least aportion of the exposure processing of the substrate P. For example, thesecond member 22 moves in parallel with at least a portion of the stepmovement operation of the substrate P (substrate stage 2) in the statewhere the liquid immersion space LS is formed. For example, the secondmember 22 moves in parallel with at least a portion of the scan movementoperation of the substrate P (substrate stage 2) in the state where theliquid immersion space LS is formed. The exposure light EL is emittedfrom the emitting surface 12 in parallel with the movement of the secondmember 22.

For example, the second member 22 may move so that the relative movement(relative speed, relative acceleration) between the second member 22 andthe substrate P (substrate stage 2) is smaller than the relativemovement (relative speed, relative acceleration) between the firstmember 21 and the substrate P (substrate stage 2) when the substrate P(substrate stage 2) performs the step movement operation.

In addition, the second member 22 may move so that the relative movement(relative speed, relative acceleration) between the second member 22 andthe substrate P (substrate stage 2) is smaller than the relativemovement (relative speed, relative acceleration) between the firstmember 21 and the substrate P (substrate stage 2) when the substrate P(substrate stage 2) performs the scan movement operation.

Moreover, the second member 22 may not move during the scan movementoperation. That is, the second member 22 may not move in parallel withthe emission of the exposure light EL from the emitting surface 12.

FIG. 7 is a schematic view showing an example of the operation of thesecond member 22. FIG. 7 is a view of the second member 22 as seen fromthe upper side.

In the descriptions below, the second member 22 moves in the X axisdirection. Moreover, as described above, the second member 22 may movein the Y axis direction and may move in an arbitrary direction in the XYplane which includes the component in the X axis direction (or the Yaxis direction).

The second member 22 moves within the movable range which is definedwith respect to the X axis direction. The movable range of the secondmember 22 is determined so that the exposure light EL from the emittingsurface 12 passes through the first opening part 23 and the secondopening part 30 and the second member 22 does not contact the firstmember 21.

In at least a part of a period in which the substrate P (object) moves,as shown in FIGS. 7(A) to 7(E), the second member 22 moves in the X axisdirection. FIG. 7(A) shows a state where the second member 22 isdisposed at a position Jr which is positioned at the furthest end of the+X side of the movable range. FIG. 7(C) shows a state where the secondmember 22 is disposed at a center position Jm in the movable range. FIG.7(E) shows a state where the second member 22 is disposed at a positionJs which is positioned at the furthest end of the −X side of the movablerange.

In the descriptions below, the position Jr of the second member 22 shownin FIG. 7(A) is appropriately referred to as a first end position Jr.The position Jm of the second member 22 shown in FIG. 7(C) isappropriately referred to as a center position Jm. The position Js ofthe second member 22 shown in FIG. 7(E) is appropriately referred to asa second end position is.

Moreover, FIG. 7(B) shows a state where the second member 22 ispositioned at a position Jrm between the first end position Jr and thecenter position Jm. FIG. 7(D) shows a state where the second member 22is positioned at a position Jsm between the second end position Js andthe center position Jm.

In addition, in the present embodiment, the state where the secondmember 22 is disposed at the center position Jm includes a state wherethe center of the second opening part 30 of the second member 22substantially coincides with the optical axis AX of the terminal opticalelement 13. The position of the second member 22, in which the center ofthe second opening part 30 coincides with the optical axis AX, may alsobe referred to as an origin point.

The size of the movable range of the second member 22 includes thedistance between the first end position Jr and the second end positionJs in the X axis direction.

The controller 6 is able to make the positions of the second member 22with respect to the terminal optical element 13 (projection region PR)be different to each other. The controller 6 is able to move the secondmember 22 between two positions which are selected from the position Jr,the position Jrm, the position Jm, the position Jsm, and the positionJs. The controller 6 is able to stop the second member 22 in at leastone of the position Jr. the position Jrm, the position Jm, the positionJsm, and the position Js.

The movement distance of the second member 22 between the position Jrand the position Jm is longer than the movement distance of the secondmember 22 between the position Jrm and the position Jm. The movementdistance of the second member 22 between the position Js and theposition Jm is longer than the movement distance of the second member 22between the position Jsm and the Jm.

The controller 6 is able to move the second member 22 according todetermined movement conditions. The movement conditions of the secondmember 22 include at least one of the movement direction, the movementspeed, the acceleration, and the movement distance. The controller 6 isable to control at least one of the movement direction, the movementspeed, the acceleration, and the movement distance of the second member22.

FIG. 8 is a view schematically showing an example of the movement locusof the substrate P when sequentially exposing a shot region Sa, a shotregion Sb, and a shot region Sc while performing the step movement whichincludes the components in the +X axis direction on the substrate P. Theshot regions Sa, Sb, and Sc are disposed in the X axis direction.

As shown in FIG. 8, when the shot regions Sa, Sb, and Sc are exposed,the substrate P sequentially moves a pathway Tp1 from a state where theprojection region PR is disposed at a position d1 of the substrate P toa state where the projection region PR is disposed at a position d2adjacent at the +Y side with respect to the position d1, a pathway Tp2from the state where the projection region PR is disposed at theposition d2 to a state where the projection region PR is disposed at aposition d3 adjacent at the +X side with respect to the position d2, apathway Tp3 from the state where the projection region PR is disposed atthe position d3 to a state where the projection region PR is disposed ata position d4 adjacent at the −Y side with respect to the position d3, apathway Tp4 from the state where the projection region PR is disposed atthe position d4 to a state where the projection region is disposed at aposition d5 adjacent at the +X side with respect to the position d4, anda pathway Tp5 from the state where the projection region PR is disposedat the position d5 to a state where the projection region PR is disposedat a position d6 adjacent at the +Y side with respect to the positiond5, under the terminal optical element 13. The positions d1, d2, d3, d4,d5, and d6 are positions in the XY plane.

At least a portion of the pathway Tp1 is a straight line parallel to theY axis. At least a portion of the pathway Tp3 is a straight lineparallel to the Y axis. At least a portion of the pathway Tp5 is astraight line parallel to the Y axis. The pathway Tp2 includes a curvedline passing through a position d2. 5. The pathway Tp4 includes a curvedline passing through a position d4. 5. The position d1 includes thestart point of the pathway Tp1, and the position d2 includes the endpoint of the pathway Tp1. The position d2 includes the start point ofthe pathway Tp2, and the position d3 includes the end point of thepathway Tp2. The position d3 includes the start point of the pathwayTp3, and the position d4 includes the end point of the pathway Tp3. Theposition d4 includes the start point of the pathway Tp4, and theposition d5 includes the end point of the pathway Tp4. The position d5includes the start point of the pathway Tp5, and the position d6includes the end point of the pathway Tp5. The pathway Tp1 is a pathwayon which the substrate P moves in the −Y axis direction. The pathway Tp3is a pathway on which the substrate P moves in the +Y axis direction.The pathway Tp5 is a pathway on which the substrate P moves in the −Yaxis direction. The pathway Tp2 and the pathway Tp4 are pathways onwhich the substrate P moves in the direction which has the −X axisdirection as the main component.

When the substrate P moves the pathway Tp1 in the state where the liquidimmersion space LS is formed, the exposure light EL is radiated to theshot region Sa via the liquid LQ. When the substrate P moves the pathwayTp3 in the state where the liquid immersion space LS is formed, theexposure light EL is radiated to the shot region Sb via the liquid LQ.When the substrate P moves the pathway Tp5 in the state where the liquidimmersion space LS is formed, the exposure light EL is radiated to theshot region Sc via the liquid LQ. When the substrate P moves the pathwayTp2 and the pathway Tp4, the exposure light EL is not radiated.

The operation in which the substrate P moves the pathway Tp1, theoperation in which the substrate P moves the pathway Tp3, and theoperation in which the substrate P moves the pathway Tp5 each includethe scan movement operation. Moreover, the operation in which thesubstrate P moves the pathway Tp2 and the operation in which thesubstrate P moves the pathway Tp4 each include the step movementoperation.

That is, the period in which the substrate P moves the pathway Tp1, theperiod in which the substrate P moves the pathway Tp3, and the period inwhich the substrate P moves the pathway Tp5 each include the scanmovement period (exposure period). The period in which the substrate Pmoves the pathway Tp2 and the period in which the substrate P moves thepathway Tp4 each include the step movement period.

FIGS. 9 and 10 are schematic views showing an example of the operationof the second member 22 when the shot regions Sa, Sb, and Sc areexposed. FIGS. 9 and 10 are views of the second member 22 as seen fromthe upper side.

When the substrate P is positioned at the position d1, as shown in FIG.9(A), the second member 22 is positioned at the position Js with respectto the projection region PR (the optical path K of the exposure lightEL).

When the substrate P is positioned at the position d2, as shown in FIG.9(B), the second member 22 is positioned at the position Jr with respectto the projection region PR (the optical path K of the exposure lightEL). That is, during the scan movement operation of the substrate P fromthe position d1 to the position d2, the second member 22 moves in the +Xaxis direction reverse to the direction (−X axis direction) of the stepmovement of the substrate P. During the scan movement operation of thesubstrate P from the position d1 to the position d2, the second member22 moves from the position Js to the position Jr via the position Jsm,the position Jm, and the position Jrm. In order words, when thesubstrate P moves the pathway Tp1, the second member 22 moves in the +Xaxis direction so that the second member 22 is changed from the stateshown in FIG. 9(A) to the state shown in FIG. 9(B).

When the substrate P is positioned at the position d2. 5, as shown inFIG. 9(C), the second member 22 is positioned at the position Jm withrespect to the projection region PR (the optical path K of the exposurelight EL).

When the substrate P is positioned at the position d3, as shown in FIG.9(D), the second member 22 is disposed at the position is with respectto the projection region PR (the optical path K of the exposure lightEL). That is, during the step movement operation of the substrate P fromthe position d2 to the position d3, the second member 22 moves in the −Xaxis direction which is the same as the direction (−X axis direction) ofthe step movement of the substrate P. During the step movement operationof the substrate P from the position d2 to the position d3, the secondmember 22 moves from the position Jr to the position Jm via the positionJrm, the position Jm, and the position Jsm. In other words, when thesubstrate P moves the pathway Tp2, the second member 22 moves in the −Xaxis direction so that the second member 22 is changed from the stateshown in FIG. 9(B) to the state shown in FIG. 9(D) via the state shownin FIG. 9(C).

When the substrate P is positioned at the position d4, as shown in FIG.10(A), the second member 22 is disposed at the position Jr with respectto the projection region PR (the optical path K of the exposure lightEL). That is, during the scan movement operation of the substrate P fromthe position d3 to the position d4, the second member 22 moves in the +Xaxis direction reverse to the direction (−X axis direction) of the stepmovement of the substrate P. During the scan movement operation of thesubstrate P from the position d3 to the position d4, the second member22 moves from the position is to the position Jr via the position Jsm,the position Jm, and the position Jrm. In other words, when thesubstrate P moves the pathway Tp3, the second member 22 moves in the +Xaxis direction so that the second member 22 is changed from the stateshown in FIG. 9(D) to the state shown in FIG. 10(A).

When the substrate P is positioned at the position d4. 5, as shown inFIG. 10(B), the second member 22 is positioned at the position Jm withrespect to the projection region PR (the optical path K of the exposurelight EL).

When the substrate P is positioned at the position d5, as shown in FIG.10(C), the second member 22 is disposed at the position Js with respectto the projection region PR (the optical path K of the exposure lightEL). That is, during the step movement operation of the substrate P fromthe position d4 to the position d5, the second member 22 moves in the −Xaxis direction which is the same as the direction (−X axis direction) ofthe step movement of the substrate P. During the step movement operationof the substrate P from the position d4 to the position d5, the secondmember 22 moves from the position Jr to the position Jm via the positionJrm, the position Jm, and the position Jsm. In other words, when thesubstrate P moves the pathway Tp4, the second member 22 moves in the −Xaxis direction so that the second member 22 is changed from the stateshown in FIG. 10(A) to the state shown in FIG. 10(C) via the state shownin FIG. 10(B).

When the substrate P is positioned at the position d6, as shown in FIG.10(D), the second member 22 is disposed at the position Jr with respectto the projection region PR (the optical path K of the exposure lightEL). That is, during the scan operation movement of the substrate P fromthe position d5 to the position d6, the second member 22 moves in the +Xaxis direction reverse to the direction (−X axis direction) of the stepmovement of the substrate P. During the scan movement operation of thesubstrate P from the position d5 to the position d6, the second member22 moves from the position Js to the position Jr via the position Jsm,the position Jm, and the position Jrm. In other words, when thesubstrate P moves the pathway Tp5, the second member 22 moves in the +Xaxis direction so that the second member 22 is changed from the stateshown in FIG. 10(C) to the state shown in FIG. 10(D).

That is, in the present embodiment, in at least a part of the period inwhich the substrate P moves along the pathway Tp2, the second member 22moves in the −X axis direction so that the relative speed between thesecond member 22 and the substrate P is decreased. In other words, in atleast a part of the period of the step movement operation in which thesubstrate P includes the component in the −X axis direction, the secondmember 22 moves in the −X axis direction so that the relative speedbetween the second member 22 and the substrate P in the X axis directionis decreased. Similarly, in at least a part of the period in which thesubstrate P moves along the pathway Tp4, the second member 22 moves inthe −X axis direction so that the relative speed between the secondmember 22 and the substrate P in the X axis direction is decreased.

In addition, in the present embodiment, the second member 22 moves inthe +X axis direction in at least of a part of the period in which thesubstrate P moves along the pathway Tp3. Accordingly, after thesubstrate P moves the pathway Tp3, during the movement of the pathwayTp4, even when the second member 22 moves in the −X axis direction, theexposure light EL is able to pass through the first and second openingparts 23 and 30, and the contact between the first member 21 and thesecond member 22 is able to be suppressed. The case where the substrateP moves the pathways Tp1 and Tp5 is also similar to the above-describedcase.

That is, when the substrate P repeats the scan movement operation andthe step movement operation including the component in the X axisdirection, during the step movement operation, the second member 22moves in the −X axis direction from the position Jr to the position Jsso that the relative speed between the second member 22 and thesubstrate P is decreased, and during the scan movement operation, thesecond member 22 returns from the position Js to the position Jr so thatthe second member 22 moves in the −X axis direction again in the nextstep movement operation. That is, since the second member 22 moves inthe +X axis direction in at least a portion of the period in which thesubstrate P performs the scan movement operation, the size of the secondopening part 30 is able to be reduced to the required minimum, and thecontact between the first member 21 and the second member 22 issuppressed.

Moreover, in the embodiment, even when the second member 22 is disposedat the first end position Jr (second end position Js), at least aportion of the first liquid recovery part 51 is continuously opposite tothe substrate P (object). Accordingly, for example, in the step movementoperation, the first liquid recovery part 51 is able to recover theliquid LQ on the substrate P (object).

In addition, in the present embodiment, even when the second member 22is disposed at the first end position Jr (second end position Js), atleast a portion of the first gas supply part 61 is continuously oppositeto the substrate P (object). Accordingly, the gas seal is continuouslyformed between the second member 22 and the substrate P (object).Therefore, flowing-out of the liquid is suppressed.

Moreover, in the example described using FIGS. 9 and 10, when thesubstrate P is positioned at the positions d1, d3, and d5, the secondmember 22 is disposed at the second end position is. When the substrateP is positioned at the positions d1, d3, and d5, the second member 22may be disposed at the center position Jm, and may be disposed at theposition ism between the center position Jm and the second end positionJs.

In addition, in the example described using FIGS. 9 and 10, when thesubstrate P is positioned at the positions d2, d4, and d6, the secondmember 22 is disposed at the first end position Jr. When the substrate Pis positioned at the positions d2, d4, and d6, the second member 22 maybe disposed at the center position Jm and may be disposed at theposition Jrm between the center position Jm and the first end positionJr.

Moreover, when the substrate P is positioned at the positions d2.5 andd4.5, the second member 22 may be disposed at positions different fromthe center position Jm. That is, when the substrate P is positioned atthe positions d2.5 and d4.5, for example, the second member 22 may bedisposed at the position Ism between the center position Jm and thesecond end position is, and may be disposed at the position Jrm betweenthe center position Jm and the first end position Jr.

In addition, in at least a part of the scan movement period of thesubstrate P, the second member 22 may stop, and may move in the −X axisdirection which is the same as the direction (−X axis direction) of thestep movement of the substrate P.

Moreover, in at least a part of the step movement period of thesubstrate P, the second member 22 may stop, and may move in the +X axisdirection reverse to the direction (−X axis direction) of the stepmovement of the substrate P.

That is, in a portion of the movement period (scan movement period andstep movement period) of the substrate P, the second member 22 moves sothat the relative speed between the second member 22 and the substrate P(object) is smaller than the relative speed between the first member 21and the substrate P (object), and in a portion of the movement period ofthe substrate P, the second member 22 may stop or may move so that therelative speed between the second member 22 and the substrate is largerthan the relative speed between the first member and the substrate.

As described above, according to the present embodiment, since thesecond member 22 which is movable with respect to the first member 21 isprovided, even when the object such as the substrate P moves in the XYplane in the state where the liquid immersion space LS is formed, forexample, the liquid LQ is suppressed from flowing out from the spacebetween the liquid immersion member 5 and the object or from remainingon the object.

That is, when the object such as the substrate P moves in the XY planeat a high speed in the state where the liquid immersion space LS isformed, if the member (liquid immersion member or the like) opposite tothe object is stopped, there is possibility that the liquid LQ may flowout, the liquid LQ may remain on the substrate P (object), or bubblesmay occur in the liquid LQ.

In the present embodiment, for example, the second member 22 is movableso that the relative movement (relative speed and relative acceleration)between the second member 22 and the object is decreased. Accordingly,even when the object moves at a high speed in the state where the liquidimmersion space LS is formed, the liquid LQ is suppressed from flowingout, the liquid LQ is suppressed from remaining on the substrate P(object), or the bubbles are suppressed from occurring in the liquid LQ.

Moreover, in the present embodiment, the first part 211 of the firstmember 21 is disposed at the surrounding of the optical path K (opticalpath KL), and the second member 22 moves outside the first part 211.Accordingly, formations of gas portion are suppressed from occurring inthe optical path space SPK, or occurrences of bubbles are suppressedfrom occurring in the liquid LQ of the optical path K. That is, in thepresent embodiment, since the first part 211 of the first member 21 isdisposed at at least a portion of the surrounding of the optical path K(optical path KL), even when the second member 22 moves outside than thefirst part 211, the pressure inside the first part 211 is suppressedfrom being changed, the pressure of the liquid LQ in the optical pathspace SPK is suppressed from being changed, or the shape of the thirdinterface LG3 of the liquid LQ is suppressed from being largely changed.Accordingly, for example, occurrences of bubbles and the like aresuppressed in the liquid LQ. Moreover, an excessive force is suppressedfrom being applied to the terminal optical element 13. In addition, inthe present embodiment, since the first member 21 does not substantiallymove, the pressure between the terminal optical element 13 and the firstmember 21 is suppressed from being largely changed, or the shapes of thesecond and third interfaces LG2 and LG3 of the liquid LQ are preventedfrom being significantly changed.

Accordingly, occurrence of exposure failure and occurrence of adefective device are able to be prevented.

Moreover, in the present embodiment, the second member 22 includes thefirst liquid recovery part 51. Accordingly, the shape of the firstinterface LG1 formed between the first liquid recovery part 51 and thesubstrate P (object) is suppressed from being changed. Therefore, theliquid LQ in the liquid immersion space LS is suppressed from flowingout from the space between the liquid immersion member 5 (second member22) and the substrate P (object), or the liquid LQ is suppressed fromremaining on the substrate P (object).

Moreover, in the present embodiment, the first liquid supply part 41 isprovided at the lower surface 24 of the first part 211. Accordingly, forexample, even when the first interface LG1 approaches the first openingpart 23 due to the movement of the object or the like, the firstinterface LG1 is suppressed from moving inside the first opening part 23due to the liquid LQ supplied from the first liquid supply part 41, orthe gas is suppressed from entering in the liquid LQ inside the firstopening part 23.

Moreover, in the present embodiment, the second liquid supply part 42 isprovided at the lower surface 31 of the second member 22. Accordingly,for example, even when the first interface LG1 approaches the firstopening part 23 (opening part 301) due to the movement of the object orthe like, the first interface LG1 is suppressed from moving inside thefirst opening part 23 (opening part 301), or the gas is suppressed fromentering in the liquid LQ inside the first opening part 23 (opening part301) due to the liquid LQ supplied from the second liquid supply part42.

Moreover, in the present embodiment, the first gas supply part 61 isprovided at the lower surface 31 of the second member 22. Therefore, thegas seal is formed between the second member 22 and the object.Accordingly, the liquid LQ is suppressed from flowing out from thesecond space SP2. In addition, since the gas G is supplied from thefirst gas supply part 61 in parallel with the recovery operation fromthe first liquid recovery part 51, a decrease in the pressure of thesecond space SP2 due to the recovery operation of the first liquidrecovery part 51 is able to be suppressed.

Moreover, in the present embodiment, the gap (fourth space SP4) betweenthe first member 21 and the second member 22 is opened to theatmosphere. Accordingly, the liquid LQ on the object is able to smoothlyflow in the fourth space SP4 via the opening part 301. Therefore, forexample, the change in the pressure of the optical path space SPK, thechange in the pressure of the third space SP3, or the change in thepressure of the second space SP2 is able to be suppressed.

In addition, in the present embodiment, the second liquid recovery part52 is provided. Accordingly, the liquid LQ flowing in the gap (fourthspace SP4) between the first member 21 and the second member 22 issuppressed from flowing out from the gap (fourth space SP4).

Moreover, in the present embodiment, the second liquid recovery part 52is disposed at the second part 212. Accordingly, after the liquid LQentering in the fourth space SP4 from the opening part 301 contacts atleast a portion of the outer surface 26, the inner surface 32, and thelower surface 28, and at least a portion of the upper surface 33, theliquid LQ is recovered from the second liquid recovery part 52. That is,since the second liquid recovery part 52 is disposed at the second part212, a contact area (contact time) between the liquid LQ and the firstmember 21 and a contact area (contact time) between the liquid LQ andthe second member 22 is able to be increased (lengthened). Accordingly,temperatures of the first member 21 and the second member 22 areadjusted by the liquid LQ which is supplied from the liquid supply part40 (at least one of the first, the second, the third liquid supply parts41, 42, and 43).

Moreover, in the present embodiment, in the fourth space SP4, the firstgap part having the size Ha and the second gap part having the size Hbare provided. Since the second liquid recovery part 52 recovers theliquid LQ from the first gap part, the second gap part becomes a gasspace. The second gap part filled with the gas functions as a dampingpart which suppresses vibration of the second member 22. The second gappart filled with the gas is able to function as a so-called squeeze filmdamper. For example, even when the second member 22 moves in the XYplane, vibration (undesired vibration) of the second member 22 withrespect to the Z axis direction is suppressed by the second gap part(damping part).

Moreover, the size Hb is 0.2 mm or less, and may be 0.01 mm to 0.1 mm.

Moreover, in the present embodiment, the wall part 333 forming thesecond gap part is provided. Accordingly, the liquid LQ in the fourthspace SP4 is suppressed from flowing out from the fourth space SP4.

In addition, in the present embodiment, at least a portion of thesurface (outer surface 26 and lower surface 28) of the first member 21and the surface (inner surface 32 and upper surface 33) of the secondmember 22 facing the gap (fourth space SP4) between the first member 21and the second member 22 has liquid repellent property with respect tothe liquid LQ. Accordingly, for example, even when the second member 22moves, the pressure of the liquid LQ in the liquid immersion space LS issuppressed from being changed, and occurrence of undesired flow of theliquid LQ is suppressed.

Moreover, according to the present embodiment, the third liquid supplypart 43 is provided. Accordingly, the optical path K is able to befilled with the liquid LQ.

In addition, in the present embodiment, the gap (third space SP3)between the terminal optical element 13 and the first member 21 isopened to the atmosphere. Accordingly, the liquid LQ above the object isable to smoothly flow into the third space SP3 via the opening part 37.Therefore, for example, the change in the pressure of the optical pathspace SPK, the change in the pressure of the third space SP3, or thechange in the pressure of the second space SP2 is prevented.

Moreover, in the present embodiment, the third liquid recovery part 53is provided. Accordingly, the liquid LQ flowing in the gap (third spaceSP3) between the terminal optical element 13 and the first member 21 isprevented from flowing out from the gap (third space SP3).

In addition, in the present embodiment, the first member 21 may move.The first member 21 may move with respect to the terminal opticalelement 13. The first member 21 may move in at least one of sixdirections of the X axis. Y axis, Z axis. θX, θY, and θZ directions. Forexample, in order to adjust a positional relationship between theterminal optical element 13 and the first member 21 or a positionalrelationship between the first member 21 and the second member 22, thefirst member 21 may move.

In addition, the first member 21 may not substantially move in theperiod in which the second member 22 moves, and may move in at least apart of the period in which the second member 22 does not move.

Moreover, the first member 21 may not substantially move in the statewhere the liquid immersion space LS is formed, and may move in the statewhere the liquid immersion space LS is not formed.

In addition, the first member 21 may not move in the period in which theexposure light EL is emitted from the emitting surface 12, and may movein the period in which the exposure light EL is not emitted from theemitting surface 12.

Moreover, the first member 21 may move in at least a part of the periodin which the second member 22 moves. In addition, the first member 21may move in the state where the liquid immersion space LS is formed.Moreover, the first member 12 may move in at least a part of the periodin which the exposure light EL is emitted from the emitting surface 12.In addition, the first member 21 may move in at least a part of theperiod in which the substrate P (object) moves.

The first member 21 may move at a lower speed than the second member 22.The first member 21 may move at a lower acceleration than the secondmember 22. The first member 21 may move at a lower speed than thesubstrate P. The first member 21 may move at a lower acceleration thanthe substrate P.

Second Embodiment

A second embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiment, and descriptions thereof aresimplified or omitted here.

FIGS. 11 to 16 show examples of dispositions of the first liquid recoverports 51M.

As shown in FIG. 11, the plurality of first liquid recovery ports 51Mmay be disposed along a rectangular virtual line. In FIG. 11, arectangular shape drawing the virtual line is a substantially square.Apexes (corners) of the rectangular shape are disposed at the +X sideand the −X side and disposed at the +Y side and the −Y side with respectto the optical path K (optical axis AX). The outer shape of the firstinterface LG1 of the liquid LQ between the second member 22 and thesubstrate P (object) is defined as a substantially rectangular shapealong the plurality of first liquid recovery ports 51M.

As shown in FIG. 12, the sides of the rectangular virtual line may becurved. The plurality of first liquid recovery ports 51M may be disposedalong the virtual line including the curved line.

As shown in FIG. 13, the plurality of first liquid recovery ports 51Mmay be disposed along a rhombic virtual line which is longer in the Yaxis direction. Moreover, the plurality of first liquid recovery ports51M may be disposed along a rhombic virtual line which is longer in theX axis direction.

As shown in FIG. 14, the plurality of first liquid recovery ports 51Mmay be disposed along a circular virtual line.

As shown in FIG. 15, the plurality of first liquid recovery ports 51Mmay be disposed along an elliptical virtual line which is longer in theY axis direction. In addition, the plurality of first liquid recoveryports 51M may be disposed along an elliptical virtual line which islonger in the X axis direction.

As shown in FIG. 16, the corners of the rectangular virtual line may berounded. The plurality of first liquid recovery ports 51M may bedisposed along the virtual line including the curved line.

Third Embodiment

A third embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 17 shows an example of a second liquid recovery part 52C accordingto the present embodiment. The second liquid recovery part 52C recoversat least a portion of the liquid LQ flowing in the gap (fourth spaceSP4) between the first member 21C and the second member 22C from abovethe substrate P (object). In the present embodiment, the second liquidrecovery part 52C is disposed at the second member 22C. In the exampleshown in FIG. 17, the second liquid recovery part 52C is disposed at theupper surface 33 of the second member 22C.

In addition, the second liquid recovery part, which recovers at least aportion of the liquid flowing in the gap between the first member 21 andthe second member 22, may be disposed at both of the first member 21 andthe second member 22.

Fourth Embodiment

A fourth embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 18 shows an example of a second gap part according to the presentembodiment. As shown in FIG. 18, a protruding part (wall part) 333D maybe provided at a first member 21D. The protruding part 333D is providedat the lower surface 28 of the first member 21D. The protruding part333D protrudes below (second member 22D side). The second gap parthaving the size Hb is defined by the lower surface of the protrudingpart 333D and the upper surface 28 of the second member 22D.

In addition, the protruding part for defining the second gap part may beprovided at both of the first member 21 and the second member 22. Thatis, the second gap part may be defined between the lower surface of theprotruding part provided at the first member 21 to protrude below andthe upper surface of the protruding part provided at the second member22 to protrude above.

Fifth Embodiment

A fifth embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 19 shows an example of a second member 22E according to the presentembodiment. As shown FIG. 19(A), a second gas supply part 62 may bedisposed outside the first gas supply part 61 in the radial directionwith respect to the optical axis AX of the terminal optical element 13.The second gas supply part 62 is disposed at the lower surface 31 of thesecond member 22. By the gas G supplied from the second gas supply part62, the liquid LQ is suppressed from flowing out from the second spaceSP2.

Sixth Embodiment

A sixth embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 20 is a view showing an example of the exposure apparatus EXaccording to the present embodiment. As shown in FIG. 20, a third member230 including a second gas supply part 62F, which is able to be oppositeto the surface of the substrate P (object), may be disposed outside thesecond member 22 with respect to the optical path K (optical axis AX) ofthe exposure light EL. The third member 230 may move based on themovement conditions (movement direction, movement speed, acceleration,or the like) of the second member 22 in at least a part of the period inwhich the second member 22 moves so that the third member 230 does notcontact the second member 22. The third member 230 may perform thesupply operation of the gas G from the second gas supply part 62F whilemoving.

Moreover, in the examples shown in FIGS. 19 and 20, a liquid recoverypart may be disposed instead of the second gas supply part 62 (62F). Theliquid recovery part is provided outside the first liquid recovery part51 and the first gas supply part 61 with respect to the optical path K(optical axis AX) of the exposure light EL, and thus, even when theliquid LQ flows outside than the first gas supply part 61, the liquid LQis able to be recovered from the liquid recovery part.

Moreover, a liquid recovery part may be disposed at addition to thesecond gas supply part 62 (62F).

Seventh Embodiment

A seventh embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 21 is a schematic view showing a relationship among the emittingsurface 12 of the terminal optical element 13, the lower surface 24 ofthe first member 21 (first part 211), and the lower surface 31 of thesecond member 22.

As shown in FIG. 21, the lower surface 24 of the first member 21 (firstpart 211) may be disposed below the emitting surface 12, may be disposedat substantially the same height as the emitting surface 12, and may bedisposed above the emitting surface 12. The lower surface 24 may bedisposed at substantially the same plane as the emitting surface 12. Thelower surface 24 may be substantially parallel to the XY plane, may beinclined to the emitting surface 12, may be inclined to the XY plane,may be a flat surface, and may include a curved surface.

As shown in FIG. 21, the lower surface 31 of the second member 22 may bedisposed below the emitting surface 12, may be disposed at substantiallythe same height as the emitting surface 12, and may be disposed abovethe emitting surface 12. The lower surface 31 may be disposed atsubstantially the same plane as the emitting surface 12. The lowersurface 31 may be substantially parallel to the XY plane, may beinclined to the emitting surface 12, may be inclined to the XY plane,may be a flat surface, and may include a curved surface.

As shown in FIG. 21, the lower surface 31 of the second member 22 may bedisposed below the lower surface 24 of the first member 21 (first part211), may be disposed at substantially the same height as the lowersurface 24, and may be disposed above the lower surface 24. The lowersurface 31 may be disposed at substantially the same plane as the lowersurface 24. The lower surface 31 may be inclined with respect to thelower surface 24. The lower surface 24 may be disposed below theemitting surface 12, may be disposed at substantially the same height asthe emitting surface 12, and may be disposed above the emitting surface12.

Eighth Embodiment

An eighth embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 22 is a view showing an example of a liquid immersion member 5Haccording to the present embodiment. As shown in FIG. 22, at least aportion of a second member 22H may be disposed below the lower surface24 of a first part 211H. In other words, at least a portion of thesecond member 22H may be disposed between the first part 211H and thesubstrate P (object). In addition, as shown in FIG. 22, at least aportion of the second member 22H may be disposed below the emittingsurface 12 of the terminal optical element 13. In order words, at leasta portion of the second member 22 may be disposed between the terminaloptical element 13 and the substrate P (object).

Moreover, as shown in FIG. 22, a second opening part 30H of the secondmember 22 may be smaller than a first opening part 23H of the firstmember 21.

Ninth Embodiment

A ninth embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 23 is a view showing an example of a liquid immersion member 5I(first member 21I) according to the present embodiment. As shown in FIG.23, a third liquid supply part 43I opposite to the outer surface 131 ofthe terminal optical element 13 is disposed at one side (for example, +Xside) with respect to the optical axis AX of the terminal opticalelement 13, and a third liquid recovery part 53I opposite to the outersurface 131 of the terminal optical element 13 may be disposed at theother side (for example, −X side) with respect to the optical axis AX ofthe terminal optical element 13. Accordingly, the liquid LQ flows fromthe one side to the other side with respect to the optical axis AX inthe optical path space SPK.

Moreover, the third liquid supply part 43I is disposed to face theoptical path K (optical path space SPK) between the emitting surface 12and the substrate P (object). The third liquid recovery part 53I may bedisposed to face the optical path K (optical path space SPK). In otherwords, one or both of the third liquid supply part 43I and the thirdliquid recovery part 53I may be disposed below the emitting surface 12.

Tenth Embodiment

Next, a tenth embodiment will be described. In the descriptions below,the same reference numerals are assigned to the same or similarcomponents as those of the above-described embodiments, and descriptionsthereof are simplified or omitted here.

In the present embodiment, an example of the operation of the secondmember 22 will be described. FIG. 24(A) is a view schematically showingan example of the movement locus of the substrate P when the shot regionSa and the shot region Sb are sequentially exposed. FIG. 24(B) is a viewschematically showing an example of the movement locus of the secondmember 22 according to the present embodiment when the shot region Saand the shot region Sb are sequentially exposed.

Also in the present embodiment, when the substrate P (substrate stage 2)performs the scan movement operation and the step movement operation inthe state where the liquid immersion space LS is formed, the secondmember 22 moves so that the relative movement (relative speed, relativeacceleration) between the second member 22 and the substrate P(substrate stage 2) is smaller than the relative movement (relativespeed, the relative acceleration) between the first member 21 and thesubstrate P (substrate stage 2).

As shown in FIG. 24(A), when the shot regions Sa is exposed, thesubstrate P sequentially moves the pathway Tp1 from the state where theprojection region PR is disposed at the position d1 of the substrate Pto the state where the projection region PR is disposed at the positiond2 adjacent at the +Y side with respect to the position d1, the pathwayTp2 from the state where the projection region PR is disposed at theposition d2 to the state where the projection region PR is disposed atthe position d3 adjacent at the +X side with respect to the position d2,the pathway Tp3 from the state where the projection region PR isdisposed at the position d3 to the state where the projection region PRis disposed at the position d4 adjacent at the −Y side with respect tothe position d3, and the pathway Tp4 from the state where the projectionregion PR is disposed at the position d4 to the state where theprojection region is disposed at the position d5 adjacent at the +X sidewith respect to the position d4, under the terminal optical element 13.The positions d1, d2, d3, and d4 are positions in the XY plane.

At least a portion of the pathway Tp1 is a straight line parallel to theY axis. At least a portion of the pathway Tp3 is a straight lineparallel to the Y axis. The pathway Tp2 includes a curved line. Thepathway Tp4 includes a curved line. The position d1 includes the startpoint of the pathway Tp1, and the position d2 includes the end point ofthe pathway Tp1. The position d2 includes the start point of the pathwayTp2, and the position d3 includes the end point of the pathway Tp2. Theposition d3 includes the start point of the pathway Tp3, and theposition d4 includes the end point of the pathway Tp3. The position d4includes the start point of the pathway Tp4, and the position d5includes the end point of the pathway Tp4. The pathway Tp1 is a pathwayon which the substrate P moves in the −Y axis direction. The pathway Tp3is a pathway on which the substrate P moves in the +Y axis direction.The pathway Tp2 and the pathway Tp4 are pathways on which the substrateP substantially moves in the −X axis direction.

When the substrate P moves the pathway Tp1 in the state where the liquidimmersion space LS is formed, the exposure light EL is radiated to theshot region Sa via the liquid LQ. The operation in which the substrate Pmoves the pathway Tp1 includes the scan movement operation. In addition,when the substrate P moves the pathway Tp3 in the state where the liquidimmersion space LS is formed, the exposure light EL is radiated to theshot region Sb via the liquid LQ.

The operation in which the substrate P moves the pathway Tp3 includesthe scan movement operation. The operation in which the substrate Pmoves the pathway Tp2 and the operation in which the substrate P movesthe pathway Tp4 include the step movement operation.

When the substrate P sequentially moves the pathways Tp1, Tp2, Tp3, andTp4, as shown in FIG. 24(B), the second member 22 sequentially movespathways Tn1, Tn2, Tn3, and Tn4. The pathway Tn1 is a pathway from aposition e1 to a position e2. The pathway Tn2 is a pathway from theposition e2 to a position e3. The pathway Tn3 is a pathway from theposition e3 to a position e4. The pathway Tn4 is a pathway from theposition e4 to the position e1. The pathway Tn1 includes a straightline. The pathway Tn2 includes a curved line. The pathway Tn3 includes astraight line. The pathway Tn4 includes a curved line. The pathway Tn1and the pathway Tn3 intersect each other. The pathway Tn1 and thepathway Tn3 are inclined to both of the X axis and the Y axis.

That is, in the present embodiment, the second member 22 moves in the XYplane such as drawing a character “8” of Arabic numerals.

In the pathway Tn1, the second member 22 moves in the +Y axis directionwhile moving in the +X axis direction. That is, in the scan movementperiod of the substrate P, the second member 22 moves in the directionreverse to the movement direction of the substrate P in the stepmovement period of the substrate P with respect to the X axis direction.

In the pathway Tn2, the second member 22 substantially moves in the −Xaxis direction. That is, in the step movement period of the substrate P,the second member 22 moves in substantially the same direction as themovement direction of the substrate P in the step movement period of thesubstrate P. The second member 22 moves so that the relative speed(relative acceleration) between the second member 22 and the substrate Pis decreased.

In the pathway Tn3, the second member 22 moves in the −Y axis directionwhile moving in the +X axis direction. That is, in the scan movementperiod of the substrate P, the second member 22 moves in the directionreverse to the movement direction of the substrate P in the stepmovement period of the substrate P with respect to the X axis direction.

In the pathway Tn4, the second member 22 substantially moves in the −Xaxis direction. That is, in the step movement period of the substrate P,the second member 22 moves in substantially the same direction as themovement direction of the substrate P in the step movement period of thesubstrate P. The second member 22 moves so that the relative speed(relative acceleration) between the second member and the substrate P isdecreased.

Also in the present embodiment, the liquid LQ is suppressed from flowingout, and bubbles are suppressed from occurring in the liquid LQ.Accordingly, occurrence of exposure failure is able to be prevented, andoccurrence of a defective device is able to be prevented.

Moreover, in the above-described first to tenth embodiments, the gas Gmay be substantially recovered from the first liquid recovery part 51,and the recovery of the liquid LQ may be suppressed. For example, theinner surface of the first liquid recovery port 51M of the first liquidrecovery part 51 is formed of a film having liquid repellent propertywith respect to the liquid LQ, and thus, the recovery of the liquid LQfrom the first liquid recovery port 51 is prevented.

Moreover, in each of the above-described embodiments, the gas G may notbe actively provided from the first gas supply part 61. In other words,the first gas supply part 61 may not be connected to the gas supplyapparatus. For example, the first gas supply part 61 may be opened tothe atmosphere (for example, exposed to the atmosphere). In the statewhere the first gas supply part 61 is opened to the atmosphere (exposedto the atmosphere), the recovery operation (suction operation) from thefirst liquid recovery part 51 is performed, and thus, the gas Gpassively flows in the second space SP2 from the first gas supply part61. Therefore, a decrease in the pressure of the second space SP2according to the recovery operation of the first liquid recovery part 51is prevented.

In addition, in each of the above-described embodiments, for example,the liquid LQ supplied from the first liquid supply part 51 and theliquid LQ supplied from the second liquid supply part 52 may bedifferent from each other. The liquid LQ supplied from the first liquidsupply part 51 and the liquid LQ supplied from the third liquid supplypart 53 may be different from each other. The liquid LQ supplied fromthe second liquid supply part 52 and the liquid LQ supplied from thethird liquid supply part 53 may be different from each other. Theliquids LQ being different from each other includes kinds (physicalproperties) of the liquids LQ being different from each other, and thekinds of the liquids LQ being the same as each other and the liquids LQbeing different from each other in at least one of temperature anddegree of cleanness.

Moreover, in each of the above-described embodiments, the first liquidrecovery part 51 and the first liquid supply part 41 may be provided atthe liquid immersion member 5, and at least a portion of the second andthird liquid recovery parts 52 and 53, the second and third liquidsupply parts 42 and 43, and the first and second gas supply parts 61 and62 may be omitted.

In addition, in each of the above-described embodiments, the firstliquid recovery part 51 and the second liquid supply part 42 may beprovided at the liquid immersion member 5, and at least a portion of thesecond and third liquid recovery parts 52 and 53, the first and thirdliquid supply parts 41 and 43, and the first and second gas supply parts61 and 62 may be omitted.

Moreover, in each of the above-described embodiments, the first liquidrecovery part 51 and the third liquid supply part 43 may be provided atthe liquid immersion member 5, and at least a portion of the second andthird liquid recovery parts 52 and 53, the first and second liquidsupply parts 41 and 42, and the first and second gas supply parts 61 and62 may be omitted.

Moreover, in each of the above-described embodiments, the first liquidrecovery part 51 and the first gas supply part 61 may be provided at theliquid immersion member 5, and at least a portion of the second andthird liquid recovery parts 52 and 53, the first, second, and thirdliquid supply parts 41, 42, and 43, and the second gas supply part 62may be omitted.

In addition, in each of the above-described embodiments, the firstliquid recovery part 51 and the second liquid recovery part 52 may beprovided at the liquid immersion member 5, and at least a portion of thethird liquid recovery part 53, the first, second, and third liquidsupply parts 41, 42, and 43, and the first and second gas supply parts61 and 62 may be omitted.

Moreover, in each of the above-described embodiments, the second gappart having the size Hb may not be provided.

In addition, in each of the above-described embodiments, the firstmember 21 may not include the second part 212. The first member 21 maynot include the upper plate part 214.

Eleventh Embodiment

An eleventh embodiment will be described. In the descriptions below, thesame reference numerals are assigned to the same or similar componentsas those of the above-described embodiments, and descriptions thereofare simplified or omitted here.

FIG. 25 is a view showing an example of a liquid immersion member 5Kaccording to the present embodiment. FIG. 26 is a view of the liquidimmersion member 5K (second member 22K) according to the presentembodiment as seen from below. The liquid immersion member 5K is able toform the liquid immersion space LS of the liquid LQ above the substrateP (object) movable below the terminal optical element 13. The liquidimmersion member 5K includes a first member 21K which is disposed at atleast a portion of the surrounding of the optical path K (KL) of theexposure light EL, and a second member 22K in which at least a portionis disposed to be opposite to the substrate P (object) below the firstmember 21K. The second member 22K is disposed at at least a portion ofthe surrounding of the optical path K. The second member 22 is movablewith respect to the first member 21.

The first member 21K is disposed at a position further away from thesubstrate P (object) than the second member 22K. At least a portion ofthe second member 22K is disposed between the first member 21K and thesubstrate P (object). At least a portion of the second member 22K isdisposed between the terminal optical element 13 and the substrate P(object). In addition, the second member 22K may not be disposed betweenthe terminal optical element 13 and the substrate P (object).

The first member 21K includes a lower surface 23K facing the −Zdirection and a fluid recovery part 24K which is disposed at at least aportion of the surrounding of the lower surface 23K. The second member22K includes an upper surface 25K facing the +Z direction, a lowersurface 26K facing the −Z direction, and a fluid recovery part 27K whichis disposed at at least a portion of the surrounding of the lowersurface 26K. The fluid recovery part 24K recovers at least a portion ofthe liquid LQ of the liquid immersion space LS. The fluid recovery part27K recovers at least a portion of the liquid LQ of the liquid immersionspace LS.

The first member 21K includes an inner surface 28K which is opposite toa side surface 131 of the terminal optical element 13, and an outersurface 29K toward the outside with respect to the optical path K (KL)of the exposure light EL. The second member 22K includes an innersurface 30K which is opposite to the outer surface 29K via a gap.

The inner surface 28K of the first member 21K is opposite to the sidesurface 131 of the terminal optical element 13 via a gap.

The second member 22K is able to be opposite to the lower surface 23K.The second member 22K is able to be opposite to the fluid recovery part24K. At least a portion of the upper surface 25K of the second member22K is opposite to the lower surface 23K via a gap. At least a portionof the upper surface 25K is opposite to the emitting surface 12 via agap. Moreover, the upper surface 25K may not be opposite to the emittingsurface 12.

The substrate P (object) is able to be opposite to the lower surface26K. The substrate P (object) is able to be opposite to at least aportion of the fluid recovery part 27K. At least a portion of the uppersurface of the substrate P is opposite to the lower surface 26K via agap. At least a portion of the upper surface of the substrate P isopposite to the emitting surface 12 via a gap.

In the Z axis direction, the size of the gap between the upper surfaceof the substrate P (object) and the emitting surface 12 is larger thanthe size of the gap between the upper surface of the substrate P(object) and the lower surface 26K. Moreover, the size of the gapbetween the upper surface of the substrate P (object) and the emittingsurface 12 may be substantially the same as the size of the gap betweenthe upper surface of the substrate P (object) and the lower surface 26K.In addition, the size of the gap between the upper surface of thesubstrate P (object) and the emitting surface 12 may be smaller than thesize of the gap between the upper surface of the substrate P (object)and the lower surface 26K.

A space SP5 is formed between the lower surface 23K and the uppersurface 25K. A space SP6 is formed between the lower surface 26K and theupper surface of the substrate P (object). A space SP7 is formed betweenthe side surface 131 and the inner surface 28K.

The side surface 131 of the terminal optical element 13 is disposed atthe surrounding of the emitting surface 12. The side surface 131 is anon-emitting surface from which the exposure light EL is not emitted.The exposure light EL passes through the emitting surface 12 and doesnot pass through the side surface 131.

The lower surface 23K of the first member 21K does not recover theliquid LQ. The lower surface 23K is a non-recovery part and is not ableto recover the liquid LQ. The lower surface 23K of the first member 21Kis able to hold the liquid LQ between the lower surface and the secondmember 22K.

The upper surface 25K of the second member 22K does not recover theliquid LQ. The upper surface 25K is a non-recovery part and is not ableto recover the liquid LQ. The upper surface 25K of the second member 22Kis able to hold the liquid LQ between the upper surface 25K and thefirst member 21K.

The lower surface 26K of the second member 22K does not recover theliquid LQ. The lower surface 26K is a non-recovery part and is not ableto recover the liquid LQ. The lower surface 26K of the second member 22Kis able to hold the liquid LQ between the substrate P (object) and thelower surface 26K.

The inner surface 28K, the outer surface 29K, and the inner surface 30Kdo not recover the liquid LQ. The inner surface 28K, the outer surface29K, and the inner surface 30K are non-recovery parts and they are notable to recover the liquid LQ.

In the present embodiment, the lower surface 23K is substantiallyparallel to the XY plane. The upper surface 25K is also substantiallyparallel to the XY plane. The lower surface 26K is also substantiallyparallel to the XY plane. That is, the lower surface 23K and the uppersurface 25K are substantially parallel to each other. The upper surface25K and the lower surface 26K are substantially parallel to each other.

Moreover, the lower surface 23K may not be parallel to the XY plane. Thelower surface 23K may be inclined with respect to the XY plane and mayinclude a curved surface.

In addition, the upper surface 25K may not be parallel to the XY plane.The upper surface 25K may be inclined with respect to the XY plane andmay include a curved surface.

Moreover, the lower surface 26K may not be parallel to the XY plane. Thelower surface 26K may be inclined with respect to the XY plane and mayinclude a curved surface.

In addition, the lower surface 23K and the upper surface 25K may beparallel to each other or may not be parallel to each other. The uppersurface 25K and the lower surface 26K may be parallel to each other ormay not be parallel to each other. The lower surface 23K and the lowersurface 26K may be parallel to each other or may not be parallel to eachother.

The first member 21K includes an opening 34K through which the exposurelight EL emitted from the emitting surface 12 is able to pass. Thesecond member 22 includes an opening 35K through which the exposurelight EL emitted from the emitting surface 12 is able to pass. At leasta portion of the terminal optical element 13 is disposed inside theopening 34K. The lower surface 23K is disposed at the surrounding of thelower end of the opening 34K. The upper surface 25K is disposed at thesurrounding of the upper end of the opening 35K. The lower surface 26Kis disposed at the surrounding of the lower end of the opening 35K.

The size of the opening 34K in the XY plane is larger than the size ofthe opening 35K. With respect to the X axis direction, the size of theopening 34K is larger than the size of the opening 35K. With respect tothe Y axis direction, the size of the opening 34K is larger than thesize of the opening 35K. In the present embodiment, the first member 21Kis not disposed immediately below the emitting surface 12. The opening34K of the first member 21K is disposed at the surrounding of theemitting surface 12. The opening 34K is larger than the emitting surface12. The lower end of the gap which is formed between the side surface131 of the terminal optical element 13 and the first member 21K facesthe upper surface 25K of the second member 22K. Moreover, the opening35K of the second member 22K is disposed to be opposite to the emittingsurface 12. In the present embodiment, the shape of the opening 35K inthe XY plane is a rectangular shape. The opening 35K is long in the Xaxis direction. Moreover, the shape of the opening 35K may be anelliptical shape which is long in the X axis direction and may be apolygonal shape which is long in the X axis direction.

In addition, the size of the opening 34K may be smaller than the size ofthe opening 35K. Moreover, the size of the opening 34K may besubstantially the same as the size of the opening 35K.

The first member 21K is disposed at the surrounding of the terminaloptical element 13. The first member 21K is an annular member. The firstmember 21K is disposed so as not to contact the terminal optical element13. A gap is formed between the first member 21K and the terminaloptical element 13K. The first member 21K does not face the emittingsurface 12. Moreover, a portion of the first member 21K may not beopposite to the emitting surface 12. That is, a portion of the firstmember 21K may be disposed between the emitting surface 12 and the uppersurface of the substrate P (object). In addition, the first member 21Kmay not be annular. For example, the first member 21K may be disposed ata portion of the surrounding of the terminal optical element 13 (opticalpath K). For example, a plurality of the first members 21K may bedisposed at the surrounding of the terminal optical element 13 (opticalpath K).

The second member 22K is disposed at the surrounding of the optical pathK. The second member 22K is an annular member. The second member 22K isdisposed so as not to contact the first member 21K. A gap is formedbetween the second member 22K and the first member 21K.

The second member 22K is movable with respect to the first member 21K.The second member 22K is movable with respect to the terminal opticalelement 13. A relative position between the first member 21K and thesecond member 22K is changed. The relative position between the secondmember 22K and the terminal optical element 13 is changed.

The second member 22K is movable in the XY plane perpendicular to theoptical axis of the terminal optical element 13. The second member 22Kis movable to be substantially parallel to the XY plane. In the presentembodiment, the second member 22K is movable in at least the X axisdirection. Moreover, the second member 22K may move in at least onedirection of the Y axis, Z axis, θX, θY, and θZ directions, in additionto the X axis direction.

In the present embodiment, the terminal optical element 13 does notsubstantially move. The first member 21K also does not substantiallymove.

The second member 22K is movable below at least a portion of the firstmember 21K. The second member 22K is movable between the first member21K and the substrate P (object).

The second member 22K moves in the XY plane, and thus, the size of thegap between the outer surface 29K of the first member 21K and the innersurface 30K of the second member 22K is changed. In other words, thesecond member 22K moves in the XY plane, and thus, the size of the spacebetween the outer surface 29K and the inner surface 30K is changed. Forexample, according to the movement of the second member 22K in the −Xaxis direction, the size of the gap between the outer surface 29K andthe inner surface 30K is decreased (the space between the outer surface29K and the inner surface 30K is decreased) at the +X side with respectto the terminal optical element 13. According to the movement of thesecond member 22K in the +X axis direction, the size of the gap betweenthe outer surface 29K and the inner surface 30K is increased (the spacebetween the outer surface 29K and the inner surface 30K is increased) atthe +X side with respect to the terminal optical element 13.

In the present embodiment, a movable range of the second member 22K isdetermined so that the first member 21K (outer surface 29K) and thesecond member 22K (inner surface 30K) do not contact each other.

The liquid immersion member 5K includes a liquid supply part 31K whichsupplies the liquid LQ to form the liquid immersion space LS. The liquidsupply part 31K is disposed at the first member 21K.

Moreover, the liquid supply part 31K may be disposed at both of thefirst member 21K and the second member 22K. In addition, the liquidsupply part 31K may be disposed at the first member 21K and may not bedisposed at the second member 22K. In addition, the liquid supply part31K may be disposed at the second member 22K and may not be disposed atthe first member 21K. Moreover, the liquid supply part 31K may bedisposed at members other than the first member 21K and the secondmember 22K.

The liquid supply part 31K is disposed inside the fluid recovery part24K and the fluid recovery part 27K in the radial direction with respectto the optical path K (the optical axis of the terminal optical element13). In the present embodiment, the liquid supply part 31K includes anopening (liquid supply port) which is disposed at the inner surface 28Kof the first member 21K. The liquid supply part 31K is disposed to beopposite to the side surface 131. The liquid supply part 31K suppliesthe liquid LQ to the space SP7 between the side surface 131 and theinner surface 28K. In the present embodiment, the liquid supply part 31Kis disposed at each of the +X side and the −X side with respect to theoptical path K (terminal optical element 13).

Moreover, the liquid supply part 31K may be disposed at the Y axisdirection with respect to the optical path K (terminal optical element13), and the plurality of liquid supply parts may be disposed at thesurrounding of the optical path K (terminal optical element 13) whichincludes the X axis direction and the Y axis direction. One liquidsupply part 31K may be provided. In addition, instead of the liquidsupply part 31K or in addition to the liquid supply part 31K, a liquidsupply part which is able to supply the liquid LQ may be provided at thelower surface 23K.

In the present embodiment, the liquid supply part (liquid supply port)31K is connected to a liquid supply apparatus 31SK via a supply channel3 IRK which is formed in the inner portion of the first member 21K. Theliquid supply apparatus 31SK is able to supply the cleaned liquid LQ, inwhich the temperature is adjusted, to the liquid supply part 31K. Inorder to form the liquid immersion space LS, the liquid supply part 31Ksupplies the liquid LQ from the liquid supply apparatus 31SK.

An opening 40K is formed between the inner edge of the lower surface 23Kand the upper surface 25K. The optical path space SPK which includes theoptical path K between the emitting surface 12 and the substrate P(object), and the space SPK5 between the lower surface 23K and the uppersurface 25K are connected to each other via the opening 40K. In thepresent embodiment, the optical path space SPK includes the spacebetween the emitting surface 12 and the substrate P (object) and thespace between the emitting surface 12 and the upper surface 25K. Theopening 40K is disposed so as to face the optical path K. The space SP7between the side surface 131 and the inner surface 28K, and the spaceSP5 are connected to each other via the opening 40K.

At least a portion of the liquid LQ from the liquid supply part 31K issupplied to the space SP5 between the lower surface 23K and the uppersurface 25K via the opening 40K. At least a portion of the liquid LQ,which is supplied from the liquid supply part 31K to form the liquidimmersion space LS, is supplied to the substrate P (object) opposite tothe emitting surface 12 via the opening 34K and the opening 35K.Accordingly, the optical path K is filled with the liquid LQ. At least aportion of the liquid LQ from the liquid supply part 31K is supplied tothe space SP6 between the lower surface 26K and the upper surface of thesubstrate P (object).

The fluid recovery part 24K is disposed outside the lower surface 23Kwith respect to the optical path K (with respect to an optical axis ofthe terminal optical element 13). The fluid recovery part 24K isdisposed at the surrounding of the lower surface 23K. The fluid recoverypart 24K is disposed at the surrounding of the optical path K of theexposure light EL. Moreover, the fluid recovery part 24K may be disposedat a portion of the surrounding of the lower surface 23K. For example, aplurality of the fluid recovery parts 24K may be disposed at thesurrounding of the lower surface 23K. The fluid recovery part 24K isdisposed to face the space SP5. The fluid recovery part 24K recovers theliquid LQ from the space SP5.

The fluid recovery part 27K is disposed outside the lower surface 26Kwith respect to the optical path K (with respect to the optical axis ofthe terminal optical element 13). The fluid recovery part 27K isdisposed at the surrounding of the lower surface 26K. The fluid recoverypart 27K is disposed at the surrounding of the optical path K of theexposure light EL. Moreover, the fluid recovery part 27K may be disposedat a portion of the surrounding of the lower surface 26K. For example, aplurality of the fluid recovery parts 27K may be disposed at thesurrounding of the lower surface 26K. The fluid recovery part 27K isdisposed to face the space SP6. The fluid recovery part 27K recovers theliquid LQ from the space SP6.

The fluid recovery part 27K is disposed outside the first member 21Kwith respect to the optical path K (the optical axis of the terminaloptical element 13). The fluid recovery part 27K is disposed outside thespace SP5 with respect to the optical path K (the optical axis of theterminal optical element 13).

In the present embodiment, movement of the liquid LQ from one of thespace SP5 at the upper surface 25 side and the space SP6 at the lowersurface 26 side to the other is suppressed. The space SP5 and the secondspace SP6 are partitioned by the second member 22K. The liquid LQ in thespace SP5 is able to move to the space SP6 via the opening 35K. Theliquid LQ in the space SP5 is not able to move to the space SP6 withoutgoing through the opening 35K. The liquid LQ, which exists in the spaceSP5 outside than the opening 35K with respect to the optical path K, isnot able to move to the space SP6. The liquid LQ in the space SP6 isable to move to the space SP5 via the opening 35K. The liquid LQ in thespace SP6 is not able to move to the space SP5 without going through theopening 35K. The liquid LQ, which exists in the space SP6 outside thanthe opening 35K with respect to the optical path K, is not able to moveto the space SP5. That is, in the present embodiment, the liquidimmersion member 5K does not have a channel which fluidly connects thespace SP5 and the space SP6, other than the opening 35K.

In the present embodiment, the fluid recovery part 27K recovers theliquid LQ from the space SP6 and does not recover the liquid LQ in thespace SP5. The fluid recovery part 24K recovers the liquid LQ from thespace SP5 and does not recover the liquid LQ in the space SP6.

Moreover, the liquid LQ, which has moved to the outside (outside theouter surface 29K) of the space SP5 with respect to the optical path K,is prevented from moving to the substrate P (the space SP5) due to theinner surface 30K.

The fluid recovery part 24 includes an opening (fluid recovery port)which is disposed at at least a portion of the surrounding of the lowersurface 23K of the first member 21K. The fluid recovery part 24K isdisposed to be opposite to the upper surface 25K. The fluid recoverypart 24K is connected to a liquid recovery apparatus 24CK via a recoverychannel (space) 24RK which is formed in the inner portion of the firstmember 21K. The liquid recovery apparatus 24CK is able to connect thefluid recovery part 24K and a vacuum system. The fluid recovery part 24Kis able to recover the liquid L from the space SP5. At least a portionof the liquid LQ in the space SP5 is able to flow into the recoverychannel 24RK via the fluid recovery part 24K.

In the present embodiment, the fluid recovery part 24 includes a porousmember, and the fluid recovery port includes holes of the porous member.In the present embodiment, the porous member includes a mesh plate. Thefluid recovery part 24 recovers the liquid LQ via the holes of theporous member. The liquid LQ in the space SP5 recovered from the fluidrecovery part 24K (holes of the porous member) flows into the recoverychannel 24R, flows through the recovery channel 24RK, and is recoveredby the liquid recovery apparatus 24CK.

The fluid recovery part 27K includes an opening (fluid recovery port)which is disposed at at least a portion of the surrounding of the lowersurface 26K of the second member 22K. The fluid recovery part 27K isdisposed to be opposite to the upper surface of the substrate P(object). The fluid recovery part 27K is connected to a liquid recoveryapparatus 27CK via a recovery channel (space) 27RK which is formed inthe inner portion of the second member 22K. The liquid recoveryapparatus 27CK is able to connect the fluid recovery part 27K and thevacuum system. The fluid recovery part 27K is able to recover at least aportion of the liquid LQ in the second space SP6. At least a portion ofthe liquid LQ in the second space SP6 is able to flow into the recoverychannel 27RK via the fluid recovery part 27K.

In the present embodiment, the fluid recovery part 27K includes a porousmember, and the fluid recovery port includes holes of the porous member.In the present embodiment, the porous member includes a mesh plate. Theliquid recovery part 27K recovers the fluid (one or both of the liquidLQ and the gas) via the holes of the porous member. The liquid LQ in thespace SP6 recovered from the fluid recovery part 27K (holes of theporous member) flows into the recovery channel 27RK, flows through therecovery channel 27KR, and is recovered by the liquid recovery apparatus27CK.

The recovery channel 27RK is disposed outside the inner surface 30K withrespect to the optical path K (the optical axis of the terminal opticalelement 13). The recovery channel 27RK is disposed above the liquidrecovery part 27K. According to the movement of the second member 22K,the fluid recovery part 27K and the recovery channel 27RK of the secondmember 22K move outside of the outer surface 29K of the first member21K.

The gas is recovered via the fluid recovery part 27K along with theliquid LQ. In addition, the porous member may not be provided at thesecond member 22K. That is, the fluid (one or both of liquid LQ and gas)in the space SP6 may be recovered without going through the porousmember.

In the present embodiment, since the recovery operation of the liquid LQfrom the fluid recovery part 27K is performed in parallel with thesupply operation of the liquid LQ from the liquid supply part 31K, theliquid immersion space LS is formed between the terminal optical element13 and the liquid immersion member 5K at one side and the substrate P(object) at the another side, by the liquid LQ.

Moreover, in the present embodiment, the recovery operation of the fluidfrom the fluid recovery part 24K is performed in parallel with thesupply operation of the liquid LQ from the liquid supply part 31K andthe recovery operation of the fluid from the fluid recovery part 27K.

In present embodiment, the interface LG5 of the liquid LQ in the liquidimmersion space LS is formed between the first member 21K and the secondmember 22K. The interface LG6 of the liquid LQ in the liquid immersionspace LS is formed between the second member 22K and the substrate P(object). The interface LG7 of the liquid LQ in the liquid immersionspace LS is formed between the terminal optical element 13 and the firstmember 21.

In the present embodiment, the second member 22K includes a gas supplypart 61K which supplies the gas G to at least a portion of thesurrounding of the liquid immersion space LS. The substrate P (object)is able to be opposite to the gas supply part 61K. The gas supply part61K is disposed to be opposite to the substrate P (object). The gassupply part 61K is disposed outside the fluid recovery part 27K withrespect to the optical path K (the center of the opening 35). The gassupply part 61K is disposed at at least a portion of the surrounding ofthe fluid recovery part 27K. A plurality of the fluid recovery parts 27Kare provided at the second member 22K, and includes openings (gas supplyports) which are able to supply the gas G. As shown in FIG. 26, in thepresent embodiment, a plurality of the gas supply parts 61K are disposedto surround the optical path K (the center of the opening 35K) outsideof the fluid recovery part 27K with respect to the optical path K (thecenter of the opening 35K).

The gas supply part 61K is connected to a gas supply apparatus 61SK viaa supply channel 61RK (space) which is formed in the inner portion ofthe second member 22K. The gas supply apparatus 61SK is able to supplythe cleaned gas G in which the temperature is adjusted. In addition, thegas supply apparatus 61SK includes a humidity adjustment apparatus whichis able to adjust humidity of the supplied gas G, and thus, is able tosupply the humidified gas G. The gas G discharged from the gas supplyapparatus 61SK is supplied to the gas supply part 61K via the supplychannel 61RK. The gas supply part 61K supplies the gas G from the gassupply apparatus 61SK to at least a portion of the surrounding of theliquid immersion space LS. In the present embodiment, the gas supplypart 61K supplies the gas G to at least a portion of the surrounding ofthe interface LG6 of the liquid LQ.

Next, an example of the operation of the liquid immersion member 5Kaccording to the present embodiment will be described. Similar to theabove-described embodiments, in the state where the liquid immersionspace LS is formed, one or both of the second member 22 and thesubstrate P (object) are moved. The gas G is supplied from the gassupply part 61K in at least a part of the period in which one or both ofthe second member 22 and the substrate P (object) are moved.

The gas supply part 61K supplies the gas G so that the liquid LQ issuppressed from flowing out from the space SP6 between the liquidimmersion member 5K and the substrate P (object) in the state where theliquid immersion space LS is formed.

FIG. 27 is a schematic view showing an example of a gas supply operationof the gas supply part 61K. FIG. 27 is a view of the second member 22Kas seen from the lower surface side. In the present embodiment, a gassupply condition from the gas supply part 61K is determined based on oneor both of the movement condition of the second member 22K and themovement condition of the substrate P (object).

For example, when the second member 22K moves in the +Y axis directionwhile moving the −X axis direction in the state where the substrate P isstopped, as shown in FIG. 27(A), the liquid immersion space LS moves tothe +X side and the −Y side with respect to the center of the secondmember 22K in the XY plane. That is, the second member 22K and theliquid immersion space LS relatively move so that the interface LG6 ofthe liquid LQ approaches the edges at the +X side and the −Y side of thesecond member 22K. In order words, the second member 22K and the liquidimmersion space LS relatively move so that the liquid LQ flows out fromthe edges at the +X side and the −Y side of the second member 22K.Moreover, for example, when the substrate P (object) moves in the −Yaxis direction while moving the +X axis direction in the state where thesecond member 22 is stopped, as shown in FIG. 27(A), the relativeposition between the second member 22K and the liquid immersion space LSis changed.

In addition, for example, when the second member 22K moves in the −Yaxis direction while moving the +X axis direction in the state where thesubstrate P stops, as shown in FIG. 27(B), the liquid immersion space LSmoves to the −X side and the +Y side with respect to the center of thesecond member 22K in the XY plane. That is, the second member 22K andthe liquid immersion space LS relatively move so that the interface LG6of the liquid LQ approaches the edges at the −X side and the +Y side ofthe second member 22K. In order words, the second member 22K and theliquid immersion space LS relatively move so that the liquid LQ flowsout from the edges of the −X side and the +Y side of the second member22K. Moreover, for example, when the substrate P (object) moves in the+Y axis direction while moving the −X axis direction in the state wherethe second member 22 is stopped, as shown in FIG. 27(B), the relativeposition between the second member 22K and the liquid immersion space LSis changed.

That is, based on the movement direction of the second member 22K in theXY plane, at least one of the flowing-out position and the flowing-outdirection of the liquid LQ from the space SP6 between the liquidimmersion member 5K and the substrate P (object) is changed. Moreover,based on the movement direction of the substrate P (object) in the XYplane, at least one of the flowing-out position and the flowing-outdirection of the liquid LQ from the space SP6 between the liquidimmersion member 5K and the substrate P (object) is changed.

In addition, based on the movement locus of the second member 22K in theXY plane, at least one of the flowing-out position and the flowing-outdirection of the liquid LQ from the space SP6 between the liquidimmersion member 5K and the substrate P (object) is changed. Moreover,based on the movement locus of the substrate P (object) in the XY plane,at least one of the flowing-out position and the flowing-out directionof the liquid LQ from the space SP6 between the liquid immersion member5K and the substrate P (object) is changed.

In addition, based on the movement speed or the acceleration of thesecond member 22K in the XY plane, at least one of the flowing-outposition, the flowing-out direction, and the flowing-out amount of theliquid LQ from the space SP6 between the liquid immersion member 5K andthe substrate P (object) is changed. Moreover, based on the movementspeed or the acceleration of the substrate P (object) in the XY plane,at least one of the flowing-out position, the flowing-out direction, andthe flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member 5K and the substrate P (object) is changed.

That is, based on one or both of the movement condition of the secondmember 22K and the movement condition of the substrate P (object), atleast one of the flowing-out position, the flowing-out direction, andthe flowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member 5K and the substrate P (object) is determined.The movement condition of the second member 22K includes at least one ofthe movement speed, the acceleration, the movement direction, and themovement locus of the second member 22K. The movement condition of thesubstrate P (object) includes at least one of the movement speed, theacceleration, the movement direction, and the movement locus of thesubstrate P (object).

Accordingly, the controller 6 is able to presume (estimate) at least oneof the flowing-out position, the flowing-out direction, and theflowing-out amount of the liquid LQ from the space SP6 between theliquid immersion member 5K and the substrate P (object) based on one orboth of the movement condition of the second member 2K and the movementcondition of the substrate P (object).

The movement condition of the second member 2K and the movementcondition of the substrate P (object) are defined by the exposure recipe(exposure control information). That is, the movement condition of thesecond member 2K and the movement condition of the substrate P (object)are known information. Therefore, the controller 6 is able to presume(estimate) at least one of the flowing-out position, the flowing-outdirection, and the flowing-out amount of the liquid LQ from the spaceSP6 between the liquid immersion member 5K and the substrate P (object)based on one or both of the movement condition of the second member 2Kand the movement condition of the substrate P (object) which are theknown information.

For example, based on one or both of the movement condition of thesecond member 2K and the movement condition of the substrate P (object),at least one of the flowing-out position, the flowing-out direction, andthe flowing-out amount of the liquid LQ is able to be obtained bysimulation, or by experiment. That is, a relationship between one orboth of the movement condition of the second member 2K and the movementcondition of the substrate P (object) and at least one of theflowing-out position, the flowing-out direction, and the flowing-outamount of the liquid LQ is able to be obtained in advance by simulationor experiment. The information is stored in the storage apparatus 7.Based on the information of the storage apparatus 7, and one or both ofthe movement condition of the second member 2K and the movementcondition of the substrate P (object) which are determined by theexposure recipe, the controller 6 is able to obtain (presume) at leastone of the flowing-out position, the flowing-out direction, and theflowing-out amount of the liquid LQ from the space SP6.

Based on information related to at least one of the flowing-outposition, the flowing-out direction, and the flowing-out amount of theliquid LQ from the space SP6 between the liquid immersion member 5 andthe substrate P (object) which are presumed by one or both of themovement condition of the second member 22 and the movement condition ofthe substrate P (object), the controller 6 determines the gas supplycondition of the gas supply part 61K.

For example, as shown in FIG. 27(A), when one or both of the secondmember 22K and the substrate P (object) move so that the liquid LQ flowsout from edges at the +X side and the −Y side of the second member 22K,the controller 6 determines the gas supply condition of each of theplurality of gas supply parts 61K so that the liquid LQ is suppressedfrom flowing out. In the example shown in FIG. 27(A), the gas G issupplied from the gas supply parts 61K which are disposed at the edgesat the +X side and the −Y side of the second member 22K among theplurality of gas supply parts 61K. In addition, as shown in FIG. 27(B),when one or both of the second member 22K and the substrate P (object)move so that the liquid LQ flows out from the edges at the −X side and+Y side of the second member 22K, the controller 6 supplies the gas Gfrom the gas supply parts 61K disposed at the edges at the −X side andthe +Y side of the second member 22K among the plurality of gas supplyparts 61K so that the liquid LQ is prevented from flowing out.

In addition, the controller 6 may determine at least one of the supplydirection, the supply range, the flow rate of the supplied gas G, andthe presence or the absence of the gas supply from the gas supply part61K, as the gas supply condition of the gas supply part 61K so that theflowing-out of the liquid LQ is suppressed.

In addition, a gas supply member, in which the gas supply part 61K isprovided, may be disposed at a member different from the liquidimmersion member 5K (second member 22K). The gas supply member may movebased on the movement condition of the second member 22K so that the gassupply member does not contact the second member 22K. The controller 6may determine the position of the gas supply part 61K (gas supplymember) so that the liquid LQ is prevented from flowing out, based onone or both of the movement condition of the second member 22K and themovement condition of the substrate P (object).

As described above, also in the present embodiment, the liquid LQ isable to be prevented from flowing out. Accordingly, occurrence ofexposure failure and occurrence of a defective device are able to beprevented.

Moreover, in the present embodiment, as shown in FIG. 28, the lowersurface 26K and the fluid recovery part 27K may be disposed atsubstantially the same plane.

In addition, in the above-described eleventh embodiment, as shown inFIG. 29, at least a portion of the first member 21K may be opposite tothe emitting surface 12 of the terminal optical element 13. That is, aportion of the first member 21K may be disposed between the emittingsurface 12 and the upper surface of the substrate P (object).

In the example shown in FIG. 29, the first member 21K includes an uppersurface 44K which is disposed at the surrounding of the opening 34K. Theupper surface 44K is disposed at the surrounding of the upper end of theopening 34K. Moreover, in the example shown in FIG. 29, a portion of theupper surface 25K of the second member 22K also is opposite to theemitting surface 12.

In addition, in each of the above-described embodiments, as shown inFIG. 29, a liquid supply part (liquid supply port) 3100 may be providedto face the space SP5. In the example shown in FIG. 29, in the liquidsupply part 3100, the lower surface 23K of the first member 21K isdisposed to face the space SP5. Moreover, the liquid supply part 3100may be disposed at the upper surface 25K of the second member 22K toface the space SP5.

For example, the liquid LQ is supplied from the liquid supply part 3100,and thus, even when the liquid LQ which is supplied from the liquidsupply part 31K facing the space SP7 does not flow in the space SP5, thespace SP5 is filled with the liquid LQ.

In addition, in above-described eleventh embodiment, the second member22K may not be opposite to the emitting surface 12. That is, the secondmember 22K may not be disposed between the emitting surface 12 and theupper surface of the substrate P (object). For example, as shown in FIG.30, the lower surface 23K of the first member 21K may be disposed atmore +Z side than the emitting surface 12. In addition, the position(height) of the lower surface 23K of the first member 21K with respectto the Z axis direction may be substantially the same as the position(height) of the emitting surface 12. The lower surface 23K of the firstmember 21K may be disposed at more −Z side than the emitting surface12K.

Moreover, in each of the above-described embodiments, the size of thegap between the upper surface of the substrate P (object) and theemitting surface 12 may be substantially the same as the size of the gapbetween the upper surface of the substrate P and the lower surface ofthe second member (22 or the like).

Moreover, in each of the above-described embodiments, the size of thegap between the upper surface of the substrate P (object and theemitting surface 12 may be smaller than the size of the gap between theupper surface of the substrate P and the lower surface of the secondmember (22 or the like).

In addition, in each of the above-described embodiments, a suction port,which sucks at least one of the liquid LQ and the gas from the spacebetween the first member (21 or the like) and the terminal opticalelement 13, may be provided at the first member 21.

In addition, in each of the above-described embodiments, the firstmember (21 or the like) may not have an annular shape. For example, thefirst member 21 may be disposed at a portion of the surrounding of theterminal optical element 13 (optical path K). For example, the pluralityof first members 21 may be disposed at the surrounding of the terminaloptical element 13 (optical path K).

Moreover, in each of the above-described embodiments, the controller 6includes a computer system which includes a CPU or the like. Inaddition, the controller 6 includes an interface which is able toperform communication with a computer system and an external apparatus.For example, the storage apparatus 7 includes a memory such as a RAM, ahard disk, and a recording medium such as a CD-ROM. In the storageapparatus 7, an operating system (OS) which controls the computer systemis installed and a program used to control the exposure apparatus EX isstored.

Moreover, an input apparatus which is able to input signals may beconnected to the controller 6. The input apparatus includes inputequipment such as a keyboard or a mouse, a communication apparatus orthe like which is able to input data from the external apparatus, andthe like. Moreover, a display apparatus such as a liquid crystal displaymay be also provided.

The controller (computer system) 6 is able to read various informationwhich includes the programs which are recorded in the storage apparatus7. Programs are recorded in the storage apparatus 7, and the programsmake the controller 6 perform the control of the liquid immersionexposure apparatus which exposes the substrate by the exposure light viathe liquid filled in the optical path of the exposure light between theemitting surface of the optical member from which the exposure light isemitted and the substrate.

Moreover, according to the above-described embodiments, the programswhich are recorded in the storage apparatus 7 may make the controller 6perform: forming a liquid immersion space of the liquid on a surface ofthe substrate by using a liquid immersion member that includes a firstmember and a second member, the first member including a first partdisposed at surrounding of an optical path of the exposure light, afirst opening part, through which the exposure light is able to pass,and a first liquid supply part being provided at the first part of thefirst member, the first liquid supply part being disposed at at leastsurrounding of the first opening part and being capable of opposing thesurface of the substrate, the second member including a first liquidrecovery part which is capable of opposing the surface of the substrateand being movable with respect to the first member outside the firstpart with respect to the optical path; exposing the substrate by theexposure light emitted from the emitting surface via the liquid of theliquid immersion space; and moving the second member with respect to thefirst member in at least a portion of exposure of the substrate.

Moreover, according to the above-described embodiments, the programswhich are recorded in the storage apparatus 7 may make the controller 6perform: forming a liquid immersion space of the liquid on a surface ofthe substrate by using a liquid immersion member that includes a firstmember and a second member, the first member including a first partdisposed at surrounding of an optical path of exposure light, a firstopening part, through which the exposure light is able to pass, beingprovided at the first part of the first member, the second memberincluding a first liquid recovery part and a first gas supply part andbeing movable with respect to the first member outside the first partwith respect to the optical path, the first liquid recovery part beingcapable of opposing the surface of the object, the first gas supply partbeing disposed outside the first liquid recovery part in a radialdirection with respect to an optical axis of an optical member and beingcapable of opposing the surface of the object; exposing the substrate bythe exposure light emitted from the emitting surface via the liquid ofthe liquid immersion space; and moving the second member with respect tothe first member in at least a portion of exposure of the substrate.

Moreover, according to the above-described embodiments, the programswhich are recorded in the storage apparatus 7 may make the controller 6perform: forming a liquid immersion space of the liquid on a surface ofthe substrate by using a liquid immersion member that includes a firstmember and a second member, the first member including a first partdisposed at surrounding of an optical path of the exposure light, afirst opening part, through which the exposure light is able to pass,being provided at the first part of the first member, the second memberincluding a first liquid recovery part and a second liquid supply partand being movable with respect to the first member outside the firstpart with respect to the optical path, the first liquid recovery partbeing capable of opposing the surface of the object, the second liquidsupply part being disposed between the optical path and the first liquidrecovery part in a radial direction with respect to an optical axis ofthe optical member and being capable of opposing the surface of theobject; exposing the substrate by the exposure light emitted from theemitting surface via the liquid of the liquid immersion space; andmoving the second member with respect to the first member in at least aportion of exposure of the substrate.

In addition, according to the above-described embodiments, the programswhich are recorded in the storage apparatus 7 may make the controller 6perform: forming a liquid immersion space of the liquid on a surface ofthe substrate by using a liquid immersion member that includes a firstmember, a second member, and a second liquid recovery part, the firstmember including a first part disposed at surrounding of an optical pathof the exposure light, a first opening part, through which the exposurelight is able to pass, being provided at the first part of the firstmember, the second member including a first liquid recovery part andbeing movable with respect to the first member outside the first partwith respect to the optical path, the first liquid recovery part beingcapable of opposing a surface of the object, the second liquid recoverypart being disposed at the first member and being capable of recoveringat least a portion of liquid which has flowed in a gap between the firstmember and the second member from above the object; exposing thesubstrate by the exposure light emitted from the emitting surface viathe liquid of the liquid immersion space; and moving the second memberwith respect to the first member in at least a portion of exposure ofthe substrate.

Moreover, according to the above-described embodiments, the programswhich are recorded in the storage apparatus 7 may make the controller 6perform: forming a liquid immersion space of the liquid on a surface ofa substrate by using a liquid immersion member that includes a firstmember, a second member, and a second liquid recovery part, wherein agap between the first member and the second member includes a first gappart having a first size, and a second gap part which is disposedoutside the first gap part with respect to the optical axis of theoptical member and has a second sire smaller than the first size, andthe second liquid recovery part is capable of recovering liquid from thefirst gap part, the first member including a first part disposed atsurrounding of an optical path of the exposure light, a first openingpart, through which the exposure light is able to pass, being providedat the first part of the first member, the second member including afirst liquid recovery part which is capable of opposing a surface of theobject and being movable with respect to the first member outside thefirst part with respect to the optical path, the second liquid recoverypart being capable of recovering at least a portion of liquid which hasflowed in the gap between the first member and the second member fromabove the object; exposing the substrate by the exposure light emittedfrom the emitting surface via the liquid of the liquid immersion space;and moving the second member with respect to the first member in atleast a portion of exposure of the substrate.

Moreover, according to the above-described embodiments, the programswhich are recorded in the storage apparatus 7 may make the controller 6perform: forming a liquid immersion space of the liquid on a substratewhich is movable below the optical member by using a first liquidimmersion member that includes a first member and a second member, thefirst member being disposed at at least a portion of surrounding of anoptical path of the exposure light, the second member being disposed sothat at least a portion of the second member is capable of opposing theobject below the first member and being movable with respect to thefirst member; exposing the substrate by the exposure light emitted fromthe emitting surface via the liquid of the liquid immersion space;moving the second member with respect to the first member in at least aportion of the exposure of the substrate; and supplying gas from a gassupply part to at least a portion of surrounding of the liquid immersionspace.

The programs which are stored in the storage apparatus 7 are read by thecontroller 6, and thus, various apparatuses of the exposure apparatus EXsuch as the substrate stage 2, the measurement stage 3, and the liquidimmersion member 5 cooperate with one another and perform variousprocessing such as the liquid immersion exposure of the substrate P inthe state where the liquid immersion space LS is formed.

Moreover, in each of the above-described embodiments, the optical path Kon the emitting surface 12 side (image surface side) of the terminaloptical element 13 of the projection optical system PL is filled withthe liquid LQ. However, for example, the projection optical system PLmay be the projection optical system in which the optical path of theincident side (object surface side) at the terminal optical element 13is also filled with the liquid LQ as disclosed in PCT InternationalPublication No. WO 2004/019128.

In addition, in each of the above-described embodiments, the liquid LQis water. However, the liquid may be liquid other than the water.Preferably, the liquid LQ is transparent with respect to the exposurelight EL, has a high refractive index with respect to the exposure lightEL, and is stable with respect to the projection optical system PL orthe film of a photosensitive material (photoresist) which forms thesurface of the substrate P or the like. For example, the liquid LQ maybe fluorinated liquid such as hydrofluoroether (HFE), perfluorinatedpolyether (PFPE), and Fomblin® oil. Moreover, the liquid LQ may bevarious fluids, for example, supercritical liquid.

Moreover, in each of the above-described embodiment, the substrate Pincludes a semiconductor wafer used to manufacture a semiconductordevice. However, for example, the substrate P include a glass substratefor a display device, a ceramic wafer for a thin film magnetic head, amask or an original plate (synthetic quartz, silicon wafer) of a reticlewhich is used in an exposure apparatus, or the like.

Moreover, in each of the above-described embodiments, the exposureapparatus EX is a scanning type exposure apparatus (scanning stepper) ofa step-and-scan system in which the mask M and the substrate Psynchronously move and the patterns of the mask M are scanned andexposed. However, for example, the exposure apparatus EX may be aprojection exposure apparatus (stepper) of a step-and-repeat system inwhich patterns of the mask M are collectively exposed in a state wherethe mask M and the substrate P are stationary and the substrate P issequentially step-moved.

In addition, the exposure apparatus EX may be an exposure apparatus (acollective exposure apparatus of a stitch system) in which, in theexposure of a step-and-repeat system, after the reduced image of a firstpattern is transferred on the substrate P using the projection opticalsystem in a state where the first pattern and the substrate P aresubstantially stationary, the reduced image of a second pattern ispartially overlapped with the first pattern using the projection opticalsystem and is collectively exposed on the substrate P in a state wherethe second pattern and the substrate P are substantially stationary.Moreover, the exposure apparatus of the stitch system may be an exposureapparatus of a step-and-stitch system in which at least two patterns arepartially overlapped on the substrate P and transferred thereto, and thesubstrate P is sequentially moved.

In addition, for example, the exposure apparatus EX may be an exposureapparatus in which patterns of two masks are combined on the substratevia the projection optical system and one shot region on the substrateis approximately simultaneously double-exposed by single scanningexposure, as disclosed in U.S. Pat. No. 6,611,316. Moreover, theexposure apparatus EX may be an exposure apparatus of a proximitysystem, a mirror projection aligner, or the like.

In addition, in each of the above-described embodiments, the exposureapparatus EX may be an exposure apparatus of a twin stage type whichincludes a plurality of substrate stages, as disclosed in U.S. Pat. No.6,341,007, U.S. Pat. No. 6,208,407, U.S. Pat. No. 6,262,796, or thelike. For example, as shown in FIG. 31, when the exposure apparatus EXincludes two substrate stages 2001 and 2002, the object which is capableof being disposed so as to be opposite to the emitting surface 12includes at least one of one substrate stage, a substrate which is heldby a first holding part of the one substrate stage, another substratestage, and a substrate which is held by a first holding part of anothersubstrate stage.

Moreover, the exposure apparatus EX may be an exposure apparatus whichincludes the plurality of substrate stages and measurement stages.

The exposure apparatus EX may be an exposure apparatus used tomanufacture a semiconductor element which exposes a semiconductorelement pattern on the substrate P, an exposure apparatus used tomanufacture a liquid crystal display element or a display, or anexposure apparatus used to manufacture a thin film magnetic head, animaging element (CCD), a micromachine, a MEMS, a DNA chip, or a reticleor mask, or the like.

Moreover, in each of the above-described embodiments, the lighttransmission type mask is used in which a predetermined light shieldingpattern (or a phase pattern, a dimming pattern) is formed on thesubstrate having light transparency. However, instead of this mask, forexample, as disclosed in U.S. Pat. No. 6,778,257, a variable moldingmask (also referred to as an electronic mask, an active mask, or animage generator) may be used which forms a transparent pattern, areflective pattern, or a light-emitting pattern based on electronic dataof the pattern to be exposed. In addition, instead of the variablemolding masks which include a non-light emission type image displayelement, a pattern-forming apparatus which includes a selflight-emission type image display element may be provided.

In each of the above-described embodiments, the exposure apparatus EXincludes the projection optical system PL. However, the components ineach of the above-described embodiments may be applied to an exposureapparatus and an exposing method which do not use the projection opticalsystem PL. For example, the components in each of the above-describedembodiments may be applied to an exposure apparatus and an exposingmethod in which the liquid immersion space is formed between an opticalmember such as a lens and the substrate and the exposure light isradiated to the substrate via the optical member.

Moreover, for example, the exposure apparatus EX may be an exposureapparatus (a lithography system) in which interference fringes areformed on the substrate P, and thus, a line-and-space pattern is exposedon the substrate P, as disclosed in PCT International Publication No. WO2001/035168.

The exposure apparatuses EX of the above-described embodiments aremanufactured by assembling various subsystems including eachabove-described component so as to maintain predetermined mechanicalaccuracy, electrical accuracy, and optical accuracy. In order to securethe various accuracies, before and after the assembly, adjustment forachieving optical accuracy with respect to various optical systems,adjustment for achieving mechanical accuracy with respect to variousmechanical systems, and adjustment for achieving electrical accuracywith respect to various electrical systems are performed. The process ofassembling the exposure apparatus from various subsystems includesmechanical connections, wiring connections of electric circuits, pipingconnections of air-pressure circuits, or the like between varioussubsystems. Of course, the respective assembly processes of eachsubsystem are needed before the assembly process from various subsystemsto the exposure apparatus. After the assembly process of exposureapparatus by various subsystems is terminated, a general adjustment isperformed, and thus, various accuracies in the overall exposureapparatus are secured. Moreover, preferably, the manufacturing of theexposure apparatus is performed in a clean room in which temperature, adegree of cleanness, or the like is controlled.

As shown in FIG. 32, a micro-device such as a semiconductor device ismanufactured through a step 201 in which the function and performancedesign of the micro-device is performed, a step 202 in which a mask(reticle) is manufactured based on the design step, a step 203 in whicha substrate which is a base material of the device is manufactured, asubstrate processing step 204 which includes the substrate processing(exposure processing) including exposing the substrate by the exposurelight from the pattern of the mask and developing the exposed substrateaccording to the above-described embodiments, a device assembly step(which includes manufacturing processes such as a dicing process, abonding process, and a package process) 205, an inspection step 206, orthe like.

Moreover, the aspects of each of the above-described embodiments may beappropriately combined. In addition, some components may not be used.Moreover, as long as legally permitted, the disclosures of allpublications and United States patents with respect to the exposureapparatuses or the like cited in each of the above-mentioned embodimentsand modifications are incorporated in the disclosures of the presentapplication.

What is claimed is:
 1. A liquid immersion member that is used in aliquid immersion exposure apparatus, and is used for forming a liquidimmersion space on a surface of an object opposite to an emittingsurface of an optical member which emits exposure light, the liquidimmersion member comprising: a first member that includes a first liquidsupply part and a first opening, through which the exposure light isable to pass; and a second member that includes a first liquid recoverypart, a first gas supply part and a second liquid supply part, and thatis movable with respect to the first member the first liquid recoverypart facing downwardly, the first gas supply part facing downwardly, thefirst gas supply part being disposed radially outward of the firstliquid recovery part with respect to the first opening of the firstmember, the second liquid supply part facing the second liquid supplypart being disposed radially inward of the first liquid recovery part.2. The liquid immersion member according to claim 1, wherein the firstgas supply part supplies the gas outside the liquid immersion space. 3.The liquid immersion member according to claim 2, wherein the first gassupply part supplies humidified gas.
 4. The liquid immersion memberaccording to claim 1, wherein the first liquid recovery part is capableof recovering at least a portion of the liquid from the second liquidsupply part.
 5. The liquid immersion member according to claim 1,wherein an interface of the liquid of the liquid immersion space ismaintained between the second liquid supply part and the first liquidrecovery part.
 6. The liquid immersion member according to claim 1,comprising: a second liquid recovery part which faces a gap between thefirst member and the second member and which recovers at least a portionof a liquid which has flowed in the sap.
 7. The liquid immersion memberaccording to claim 6, wherein the second liquid recovery part isdisposed at the first member or the second member or both of the firstand second members.
 8. The liquid immersion member according to claim 6,wherein the second liquid recovery part is disposed above the firstopening of the first member.
 9. The liquid immersion member according toclaim 6, wherein the gap between the first member and the second memberincludes a first gap part having a lower portion which is open towarddownward and extending upwardly from the lower portion to an upperportion, and a second gap part extending radially outwardly from theupper portion of the first gap part, and wherein the second liquidrecovery part faces the first gap part and recovers the liquid from thefirst gap part.
 10. The liquid immersion member according to claim 9,wherein the second member is movable in a plane, and wherein a firstopposing surface of the first member and a second opposing surface ofthe second member which define the second gap part are substantiallyparallel to the plane.
 11. The liquid immersion member according toclaim 6, wherein the first member has a first opposing surface, thesecond member has a second opposing surface, and the first and secondopposing surfaces define the gap, and the second liquid recovery part isdisposed at the first opposing surface or the second opposing surface,or both of the first and second opposing surfaces.
 12. The liquidimmersion member according to claim 6, wherein one end of the gapbetween the first member and the second member is arranged so that theone end of the gap between the first member and the second memberopposes the surface of the object, and wherein the liquid above theobject is able to flow in the gap from the one end of the gap betweenthe first member and the second member.
 13. The liquid immersion memberaccording to claim 12, wherein the gap between the first member and thesecond member communicates with an outside space via other end of thegap.
 14. The liquid immersion member according to claim 13, wherein theother end of the gap between the first member and the second member isarranged so that the other end of the gap between the first member andthe second member does not oppose the surface of the object.
 15. Theliquid immersion member according to claim 13, wherein the other end ofthe gap between the first member and the second member is disposed at ahigher position than the one end of the gap.
 16. The liquid immersionmember according to claim 13, wherein the other end of the gap betweenthe first member and the second member cannot contact the liquid abovethe object.
 17. The liquid immersion member according to claim 6,wherein the first member has a first opposing surface, the second memberhas a second opposing surface, and the first and second opposingsurfaces define the gap, at least a portion of one or both of the firstand second opposing surfaces having a liquid repellent property withrespect to liquid.
 18. The liquid immersion member according to claim 1,wherein the first member has a first lower surface facing downwardly andextending radially outwardly around the first opening, the second memberhas a second opening through which the exposure light is able to pass,the second member has a second lower surface facing downwardly andextending radially outwardly around the second opening, and the secondlower surface is located outside of the first lower surface with respectto the first opening.
 19. The liquid immersion member according to claim18, wherein the first lower surface and the second lower surface aredisposed at substantially the same plane.
 20. The liquid immersionmember according to claim 18, wherein the first lower surface isdisposed below the emitting surface.
 21. The liquid immersion memberaccording to claim 1, wherein the first member includes a third liquidsupply part which supplies the liquid to a gap between the first memberand the optical member.
 22. The liquid immersion member according toclaim 21, wherein the third liquid supply part is disposed above thefirst opening.
 23. The liquid immersion member according to claim 21,wherein the third liquid supply part is disposed at the first member sothat the third liquid supply part opposes an outer surface of theoptical member.
 24. The liquid immersion member according to claim 23,wherein the first member includes a third liquid recovery part which isdisposed to be opposite to the outer surface of the optical member andis capable of recovering liquid from the gap between the optical memberand the first member, wherein the third liquid supply part is disposedat one side of the optical member, and wherein the third liquid recoverypart is disposed at other side of the optical member.
 25. The liquidimmersion member according to claim 1, wherein the first member includesa third liquid recovery part which is capable of recovering liquid froma gap between the first member and the optical member.
 26. The liquidimmersion member according to claim 25, wherein the third liquidrecovery part is disposed above the first opening.
 27. The liquidimmersion member according to claim 25, wherein the third liquidrecovery part is disposed to be opposite to an outer surface of theoptical member, and is capable of recovering liquid from the gap betweenthe optical member and the first member.
 28. The liquid immersion memberaccording to claim 1, wherein the second member is movable in a planeperpendicular to an optical axis of the optical member.
 29. The liquidimmersion member according to claim 1, wherein the second member ismoved based on a movement condition of the object.
 30. The liquidimmersion member according to claim 1, wherein the second member ismoved in a state where the liquid immersion space is formed.
 31. Theliquid immersion member according to claim 1, wherein the second memberis moved in at least a portion of a period in which the exposure lightis emitted from the emitting surface.
 32. The liquid immersion memberaccording to claim 1, wherein the first member has a first lower surfacefacing downwardly and extending radially outwardly around the firstopening, and the first lower surface includes a lowermost part of thefirst member.
 33. The liquid immersion member according to claim 1,wherein the first member has a first lower surface facing downwardly andextending radially outwardly around the first opening, and the firstlower surface includes a portion of the first member which is closest tothe surface of the object.
 34. The liquid immersion member according toclaim 1, wherein the first member has a first lower surface facingdownwardly and extending radially outwardly around the first opening,and the first lower surface is disposed below the emitting surface ofthe optical member.
 35. An exposure apparatus that exposes a substratevia liquid by exposure light, the exposure apparatus comprising: aprojection system having the optical member, and the liquid immersionmember according to claim 1, wherein the liquid immersion member ismoved in a direction substantially perpendicular to an optical axis ofthe optical member.
 36. The exposure apparatus according to claim 35,comprising: a third member that includes a second gas supply part facingdownwardly, wherein the second gas supply part is disposed radiallyoutward of the first gas supply part of the second member with respectto the first opening of the first member.
 37. The exposure apparatusaccording to claim 35, wherein the second member is moved so that arelative speed between the second member and the object is decreased.38. The exposure apparatus according to claim 35, wherein the secondmember is moved so that a relative speed between the second member andthe object is smaller than a relative speed between the first member andthe object.
 39. The exposure apparatus according to claim 35, whereinthe second member is moved so that a relative acceleration between thesecond member and the object is decreased.
 40. The exposure apparatusaccording to claim 35, wherein the second member is moved so that arelative acceleration between the second member and the object issmaller than a relative acceleration between the first member and theobject.
 41. The exposure apparatus according to claim 35, wherein theobject includes the substrate, wherein the substrate moves a secondpathway after the substrate has moved a first pathway in a planesubstantially perpendicular to an optical axis of the optical member ina state where the liquid immersion space is formed, wherein, in thefirst pathway, the movement of the substrate includes a movement in afirst direction substantially parallel to a first axis in the plane,wherein, in the second pathway, the movement of the substrate includes amovement in a second direction substantially parallel to a second axisorthogonal to the first axis in the plane, and wherein the second memberis moved in the second direction in at least a part of a period in whichthe substrate moves the second pathway.
 42. The exposure apparatusaccording to claim 41, wherein the exposure light is radiated to a shotregion of the substrate via the liquid of the liquid immersion spacewhen the substrate moves the first pathway, and the exposure light isnot radiated when the substrate moves the second pathway.
 43. Theexposure apparatus according to claim 41, wherein the substrate moves athird pathway after the substrate moves the second pathway, wherein inthe third pathway, the movement of the substrate includes a movement ina third direction opposite to the first direction, and wherein themovable member moves in a fourth direction opposite to the seconddirection in at least a part of a period in which the substrate movesthe third pathway.
 44. The exposure apparatus according to claim 35,wherein the object includes the substrate, wherein the substrateperforms a step movement in a step direction so that a second shotregion is disposed at an exposure starting position after a first shotregion of the substrate has been exposed while the substrate hasperformed a scan movement in a scan direction, in the state where theliquid immersion space is formed, and wherein the second member moves insubstantially a same direction as the step movement in at least aportion of the step movement of the substrate.
 45. The exposureapparatus according to claim 44, wherein the second member moves in adirection substantially opposite to the step direction in at least aportion of the scan movement of the substrate.
 46. The exposureapparatus according to claim 35, wherein the object includes a substratestage which is capable of moving while holding the substrate.
 47. Amethod of manufacturing a device, comprising: exposing the substrateusing the exposure apparatus according to claim 35; and developing theexposed substrate.
 48. The liquid immersion member according to claim 1,wherein the first member has a first lower surface facing downwardly andextending radially outwardly around the first opening, and the firstmember has the first liquid supply part provided in the first lowersurface and facing downwardly.
 49. The liquid immersion member accordingto claim 48, wherein the second liquid supply part of the second memberis located radially outward of the first liquid supply part of the firstmember with respect to the first opening.
 50. The liquid immersionmember according to claim 48, wherein the first liquid supply part has aplurality of supply ports disposed along the first opening.
 51. Theliquid immersion member according to claim 1, wherein the second liquidsupply part has a plurality of supply ports.
 52. The liquid immersionmember according to claim 1, wherein the first liquid recovery part hasa plurality of recovery ports.
 53. The liquid immersion member accordingto claim 52, wherein the second member has a second opening throughwhich the exposure light is able to pass, and the plurality of recoveryports of the first liquid recovery part are arranged to surround thesecond opening.
 54. The liquid immersion member according to claim 53,wherein, the second member has a lower portion extending around thesecond opening, and the plurality of recovery ports of the first liquidrecovery part are arranged in a rhombic shape at the lower portion ofthe second member.
 55. The liquid immersion member according to claim54, wherein, the first gas supply part has a plurality of supply ports,and wherein the plurality of supply ports of the first gas supply partare arranged in a rhombic shape at the lower portion of the secondmember.
 56. The liquid immersion member according to claim 1, whereinthe first gas supply part has a plurality of supply ports.
 57. Theliquid immersion member according to claim 56, wherein the second memberhas a second opening through which the exposure light is able to passand the plurality of supply ports of the first gas supply part arearranged to surround the second opening.
 58. The liquid immersion memberaccording to claim 57, wherein, the second member has a lower portionextending around the second opening, and the plurality of supply portsof the first gas supply part are arranged in a rhombic shape at thelower portion of the second member.
 59. An exposing method comprising:forming a liquid immersion space on only a portion of a surface of asubstrate opposite to an emitting surface of the optical member usingthe liquid immersion member according to claim 1, and exposing thesubstrate to exposure light from the emitting surface via liquid in theliquid immersion space.
 60. A method of manufacturing a device,comprising: exposing a substrate using the exposing method according toclaim 59; and developing the exposed substrate.
 61. The liquid immersionmember according to claim 1, wherein the first opening has substantiallycircular shape in a plane perpendicular to an optical axis of theoptical member.
 62. An exposing method that exposes a substrate byexposure light via liquid between an emitting surface of an opticalmember emitting the exposure light and the substrate, the exposingmethod comprising: forming a liquid immersion space of the liquid on asurface of the substrate by using a liquid immersion member thatincludes a first member and a second member, the first member includinga first liquid supply part and a first opening, through which theexposure light is able to pass, the second member including a firstliquid recovery part, a first gas supply part and a second liquid supplypart, and being movable with respect to the first member, the firstliquid recovery part facing downwardly, the first gas supply part facingdownwardly, the first gas supply part being disposed radially outward ofthe first liquid recovery part with respect to the first opening of thefirst member, the second liquid supply part facing downwardly, and thesecond liquid supply part being disposed radially inward of the firstliquid recovery part; exposing the substrate by the exposure lightemitted from the emitting surface via the liquid of the liquid immersionspace; and moving the second member with respect to the first member inat least a portion of exposure of the substrate.
 63. A method ofmanufacturing a device, comprising: exposing a substrate using theexposing method according to claim 62; and developing the exposedsubstrate.